Study of the structural properties of nanostructured PbS thin films deposited by RF sputtering at room temperature

High-performance CH3NH3PbI3:PbS nanorod-based photodetectors fabricated using a slot die technique

“…The calculated d 200 value of the PbS films (∼5.83 Å) matched the previously reported value, 34 which confirmed the face-centered cubic structure of the PbS. Applying the Debye–Scherrer formula, we calculated the average crystallite size ( d X-ray ) for the PbS films, 35 where λ is the wavelength of the diffracted radiation (CuK α , λ = 1.54 Å), θ B is the Bragg angle, and β is the full width at half maximum (FWHM) in radians indexed to the (200) diffraction plane.…”

“…The calculated d 200 value of the PbS films (B5.83 Å) matched the previously reported value, 34 which confirmed the facecentered cubic structure of the PbS. Applying the Debye-Scherrer formula, we calculated the average crystallite size (d X-ray ) for the PbS films, 35…”

Effect of Deposition Time on Structural and Optoelectronic Properties of Flower-Like Nanostructured PbS Thin Films

“…Further, the essential requisite of a sensor material need to be balanced with the processing costs for practical applications. There are many reports of chemically synthesized PbS thin films with characterization of their significant properties [19,20]. But to the best of our knowledge, PbS thin films with a morphology of flower-like structure is rarely reported.…”

Correlation between plasma characteristics, morphology, and microstructure of sputtered CuAl alloy films with varied target geometry

“…Planar cathodes produce plasma densities that are orders of magnitude lower than HIPIMS and I-PVD, yet, planar sputtering can achieve uniform coatings on surfaces within its line-of-sight by leveraging unidirectional deposition via techniques such as collimation and long throw sputtering [2,10,11]. Qualitative tools for planar film deposition, such as structure zone maps, have been developed to predict changes in grain size, microstructure, and morphology, which enable the technique to tailor deposited film mechanical, optical, thermal, and electronic properties [1,[12][13][14][15]. In contrast, due to its target geometry, hollow cathode sputtering is affected by additional factors such as greater plasma densities and a 360°line-of-sight, which in turn affect the microstructure and morphology beyond current structure zone maps representations [1,12,[15][16][17][18].…”