2015
DOI: 10.1016/j.spmi.2014.10.029
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Study the target effect on the structural, surface and optical properties of TiO2 thin film fabricated by RF sputtering method

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Cited by 46 publications
(11 citation statements)
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“…(b) and listed in Table S5. It was observed that the direct band gap value of the thin film nitrided at 600 °C was 3.61 eV, which was in agreement with other report for TiO 2 thin film . When the nitridation temperatures increased from 600 °C to 900 °C, the direct band gap of the thin films was found to decrease gradually.…”
Section: Resultssupporting
confidence: 91%
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“…(b) and listed in Table S5. It was observed that the direct band gap value of the thin film nitrided at 600 °C was 3.61 eV, which was in agreement with other report for TiO 2 thin film . When the nitridation temperatures increased from 600 °C to 900 °C, the direct band gap of the thin films was found to decrease gradually.…”
Section: Resultssupporting
confidence: 91%
“…The enhancement factor (EF) was determined according to the formula below EF=0.25em()ISERStrue/CSERS0.25emtrue/0.25em()Ireftrue/Cref. …”
Section: Resultsmentioning
confidence: 99%
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“…Transparent thin films based on titanium dioxide (TiO 2 ) and hafnium dioxide (HfO 2 ) are widely used in industrial applications such as optical and protective coatings or optoelectronic devices. HfO 2 and TiO 2 are characterized by many advantages, e.g., very good thermal, chemical, and mechanical stability and high transparency [1][2][3][4][5]. Both are also known as hard oxides with high wear and scratch resistance to mechanical damage.…”
Section: Introductionmentioning
confidence: 99%
“…Various methods has been reported to produce a thin layer of TiO 2 such as electrophoretic deposition [7], electrodeposition [8], doctor blades [9], RF sputtering [10], sol gel [11], dip-coating [12], spin coating, etc. In this study, we use a spin coating method to deposit TiO 2 layer.…”
Section: Introductionmentioning
confidence: 99%