2016
DOI: 10.1038/srep23823
|View full text |Cite
|
Sign up to set email alerts
|

Sub-10 nm feature chromium photomasks for contact lithography patterning of square metal ring arrays

Abstract: Advances in photolithographic processes have allowed semiconductor industries to manufacture smaller and denser chips. As the feature size of integrated circuits becomes smaller, there has been a growing need for a photomask embedded with ever narrower patterns. However, it is challenging for electron beam lithography to obtain <10 nm linewidths with wafer scale uniformity and a necessary speed. Here, we introduce a photolithography-based, cost-effective mask fabrication method based on atomic layer deposition… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
13
0

Year Published

2017
2017
2023
2023

Publication Types

Select...
10

Relationship

2
8

Authors

Journals

citations
Cited by 16 publications
(13 citation statements)
references
References 34 publications
0
13
0
Order By: Relevance
“…Such a wavelength, however, requires a quartz glass slide and also allows us to use UV-sensitive PMMA-based electron resists. Potentially, a nanometer resolution could be achieved via various sophisticated methods of mask production [ 44 , 45 ] essentially exploiting the near-field exposure.…”
Section: Discussionmentioning
confidence: 99%
“…Such a wavelength, however, requires a quartz glass slide and also allows us to use UV-sensitive PMMA-based electron resists. Potentially, a nanometer resolution could be achieved via various sophisticated methods of mask production [ 44 , 45 ] essentially exploiting the near-field exposure.…”
Section: Discussionmentioning
confidence: 99%
“…To realize such large-area sample with high-resolution patterning, various recipes have been introduced, e.g. fs-laser machining for microscale punctured structures [64,241,242], focused ion beam [243,244], e-beam lithography [245,246], and photolithography techniques [125,247,248] for metamaterial structures and, finally, atomic layer deposition (ALD) for atomic-scale gap structures [75,193,249,250]. For nanoscale gap structures, photolithography can be considered as a promising fabrication method for mass production at the same time, as shown in Figure 16.…”
Section: Fabrication Of Wafer-scale Nanogap Arraysmentioning
confidence: 99%
“…Because they can generate high-intensity nano-scale electromagnetic radiation in a fraction of a second, the modern development of plasmon lasers today has sparked the investigation of nanoscience and technology. This would enable more feature sizes than the conventional lasers [ 22 , 23 ]. They could also be used to package additional information onto storage media such as hard disks or DVDs [ 24 , 25 ].…”
Section: Advances In Photonicsmentioning
confidence: 99%