Subpixel sensitivity map for a charge-coupled device sensor

Kavaldjiev, Daniel; Ninkov, Zoran

doi:10.1117/1.601788

Cited by 57 publications

(38 citation statements)

References 17 publications

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“…As it was shown in Ref. 42 there is a dependence of the effective pixel optical center depending on the wavelength of the light. An effect of the order of 0.01 μm/nm (optical position varies by ~30% of the pixel pitch between 905 nm and 400 nm) was experimentally observed with a CCD with pixel pitch of 24 μm.…”

Section: Ltp Drifts and Instabilitiesmentioning

confidence: 87%

Performance of the upgraded LTP-II at the ALS Optical Metrology Laboratory

Kirschman

Domning

McKinney³

et al. 2008

SPIE Proceedings

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The next generation of synchrotrons and free electron laser facilities requires x-ray optical systems with extremely high performance, generally of diffraction limited quality. Fabrication and use of such optics requires adequate, highly accurate metrology and dedicated instrumentation. Previously, we suggested ways to improve the performance of the Long Trace Profiler (LTP), a slope measuring instrument widely used to characterize x-ray optics at long spatial wavelengths. The main way is use of a CCD detector and corresponding technique for calibration of photo-response non-uniformity [J. L. Kirschman, et al., Proceedings of SPIE 6704, 67040J (2007)]. The present work focuses on the performance and characteristics of the upgraded LTP-II at the ALS Optical Metrology Laboratory. This includes a review of the overall aspects of the design, control system, the movement and measurement regimes for the stage, and analysis of the performance by a slope measurement of a highly curved super-quality substrate with less than 0.3 microradian (rms) slope variation.

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Section: Ltp Drifts and Instabilitiesmentioning

confidence: 87%

Performance of the upgraded LTP-II at the ALS Optical Metrology Laboratory

Kirschman

Domning

McKinney³

et al. 2008

SPIE Proceedings

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“…As far as the CCD detector is concerned, the majority of its characteristics (such as variations between pixels in quantum efficiency, dark current, charge transfer efficiency, amplifier gain, and bias) can be calibrated and corrected rather easily [74][75][76]. However, characteristics such as errors in the CCD's pixel position due to chip fabrication tolerances or intra-pixel quantum efficiency variations (i.e., changes in the light sensitivity across each pixel due to its internal make-up [77,78]) resist easy calibration.…”

Section: Metrological Characterisation Of Autocollimatorsmentioning

confidence: 99%

Pushing the limits: latest developments in angle metrology for the inspection of ultra-precise synchrotron optics

2014

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The requirements on the quality of ultra-precise X-ray optical components for application in the Synchrotron Radiation (SR) community are increasing continually and strongly depend on the quality of the metrology devices available to measure such optics. To meet the upcoming accuracy goal of 50 nrad rms for slope measuring profilers, a dedicated project, SIB58 Angles, consisting of 16 worldwide partners and supported by the European Metrology Research Programme (EMRP) was started in Sep 2013. The project covers investigations on autocollimators under extremely challenging measuring conditions, ray-tracing models, 2D autocollimator calibration (for the first time worldwide), determination of error sources in angle encoders providing traceability by 'sub-division of 2π rad' with nrad uncertainty, angle generation by 'ratio of two lengths' in nrad level, and on the development of portable precise Small Angle Generators (SAGs) for regular in-situ checks of autocollimators' performance. Highlights from the project will be reported in the paper and the community of metrology for X-Ray and EUV Optics will be informed about its progress and the latest work in angle metrology.

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“…We conclude this section with a discussion on the indirect techniques. [9,10,11]. The microscope allows the de-magnification and focusing of the pinhole illumination onto the DUT.…”

Section: B Overview Of the Measurement Techniquesmentioning

confidence: 99%