Substrate temperature influenced structural, electrical and optical properties of dc magnetron sputtered MoO3 films

Structural and optical properties of nanocrystalline α-MoO3 thin films prepared at different annealing temperatures

“…These results confirm the results obtained by XRD analysis. The FTIR studies of the present work agree well with the reports on MoO 3 thin films prepared using dc magnetron sputtering method by Uthanna et al [15]. The three-dimensional AFM images of the prepared films are shown in Fig.…”

“…The orthorhombic MoO 3 has a layered structure, containing two layers of octahedral MoO 6 , held together by double covalent forces in the a and c axes; contiguous layers are kept together along the b axes by Van der Waal's forces [6]. MoO 3 thin films have attracted much interest for technological and industrial applications in recent years, including elements for energy efficient window technology, optical switching, coating high-density, memory devices, gas sensors, and lithium ion batteries [1][2][3][4][5][6][7][8][9][10][11][12]15]. In addition, the optical property of MoO 3 is higher than those of many other inorganic materials because the incorporator indicates stronger and more uniform absorption of light in its colored state [13].…”

Sublimation growth and vibrational microspectrometry of α-MoO3 single crystals

“…Because of high thermodynamic stability at normal conditions the a-MoO 3 crystals are most widely used in thin film device structures and as basic material for chemically modified MoO 3 -products [1][2][3]5,13,17,18,[21][22][23][24][25]. Knowledge of structural and spectroscopic parameters of a-MoO 3 crystal is actual for diagnostics with account of anisotropy effects.…”

“…Presently four polymorph modifications are known for molybdenum trioxide, orthorhombic a-MoO 3 [6,7], monoclinic b-MoO 3 [8], high-pressure monoclinic MoO 3 -II [9] and hexagonal h-MoO 3 [10,11]. Phase composition, micromorphology and defect structure of molybdenum oxides in thin film, micro-and nanocrystalline forms are strongly dependent on the technological conditions used for synthesis [3][4][5]7,[12][13][14][15][16][17][18]. Orthorhombic a-MoO 3 , space group Pbmn, with unique layered structure is a stable polymorph modification at normal conditions [6,7].…”

Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma

“…8 Moreover, recently, MoO 3 has been used in organic photovoltaics, 9 perovskite solar cells, 10 and silicon solar cells as hole extraction layer. [11][12][13] A wide range of deposition techniques has been employed for the growth of MoO 3 films, such as thermal evaporation, 14 electron beam evaporation, 15 sputtering, [16][17][18] chemical vapor deposition (CVD), 19 and atomic layer deposition (ALD). 9,20 Of these techniques, ALD offers the advantages of uniform and conformal growth, in conjunction with atomic level thickness control, merits which are highly desirable for some of the abovementioned applications.…”