“…The soft prealloying process and tailoring Mo surface cannot completely suppress Mo(S,Se) 2 formation; to circumvent this issue, various intermediate layers such as Al 2 O 3 , ZnO, TiO 2 , TiB 2 , graphene oxide (GO), carbon, Ag, VSe 2 , MoO 3 , and CuO have been investigated to minimize the formation of Mo(S,Se) 2 during the sulfo-selenization process. ,, The p-type transparent conducting oxide materials can effectively transport holes and minimize the electron transport in TFSCs . As a back-intermediate layer, CuAlO 2 (CAO) can be a suitable candidate because it has p-type electrical conductivity and consists of earth-abundant and nontoxic elements, as the CZTSSe materials. , In our previous study, we improved the device efficiency with an individual attempt of back-interface passivation with a CAO layer and defect passivation in CZTSSe through Ge doping. , However, the application of the back-interface passivation layer could not suppress the density of bulk defects to a larger extent. The metallic layer applied at the back-interface during a single cation substitution also does not prevent the interfacial reaction among S/Se vapors.…”