1988
DOI: 10.1063/1.99354
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Surface acoustic wave propagation on lead zirconate titanate thin films

Abstract: Piezoelectric activity in reactively sputtered lead zirconate titanate [Pb(Zr,Ti)O3 or PZT] thin films has been confirmed through the fabrication of surface acoustic wave delay lines on poled polycrystalline films of PZT deposited on glass substrates. Films of varying thickness ranging from 3.4 to 6 μm show a dispersion in resonant frequency for interdigital transducers designed to resonate at 44 MHz on bulk PZT material. The electromechanical coupling coefficient k2 was in the range 0.57–0.79% for hk=0.21–0.3… Show more

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Cited by 97 publications
(21 citation statements)
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“…PZT films have been widely used in ferroelectric random access memory (FRAM) [5], surface acoustic wave (SAW) devices [6] and infrared detectors. Because of the existence of a low temperature rhombohedral (F R(LT) )-high temperature rhombohedral (F R(HT) ) ferroelectric phase transition in the Zr-rich (Zr > 90 mol%) lead zirconate titanate, when the F R(LT) -F R(HT) phase transition is induced by temperature, a nonlinear change of spontaneous polarization occurs, and a large pyroelectric coefficient (p) is obtained.…”
Section: Introductionmentioning
confidence: 99%
“…PZT films have been widely used in ferroelectric random access memory (FRAM) [5], surface acoustic wave (SAW) devices [6] and infrared detectors. Because of the existence of a low temperature rhombohedral (F R(LT) )-high temperature rhombohedral (F R(HT) ) ferroelectric phase transition in the Zr-rich (Zr > 90 mol%) lead zirconate titanate, when the F R(LT) -F R(HT) phase transition is induced by temperature, a nonlinear change of spontaneous polarization occurs, and a large pyroelectric coefficient (p) is obtained.…”
Section: Introductionmentioning
confidence: 99%
“…Ferroelectric thin films can be prepared by a number of different deposition methods [5][6][7][8][9][10][11][12]. The sol-gel method is preferred for many applications because it offers both compositional control and reduced-temperature processing of highly uniform, dense, crack-free films.…”
Section: Introductionmentioning
confidence: 99%
“…Ferroelectric thin films can be prepared by a number of different deposition methods for example, ion beam sputtering [5], rf magnetron sputtering [6] or dc magnetron sputtering [7], pulsed laser deposition (PLD) [8], chemical vapour deposition (MOCVD) [9][10] and chemical solution deposition (CSD) [11][12]. The sol-gel method is preferred for many applications because it offers both compositional control and reduced-temperature processing of highly uniform, dense, crack-free films.…”
Section: Introductionmentioning
confidence: 99%