Surface characterization of photodeposited silicon/germanium alloy films

Mains, Gilbert J.; Schreiner, Jürgen; Fleisch, T. H.

doi:10.1021/j150626a027

Cited by 10 publications

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“…Introduction Some semiconducting metal oxides have been shown to be reduced with light to the metallic state if the bandgap of the semiconducting metal oxide is greater in energy than the reverse of the heat of formation of the metal oxide. [1][2][3][4][5] All of this type of research studied to date has concerned photoreduction of metal oxides in the powdered state. For example, Fleisch and Mains1-5 used X-ray photoelectron spectroscopy to study the photoreduction of CuO, PdO, PtO, W03, Mo03, and ZnO.…”

Section: Discussionmentioning

confidence: 99%

“…According to the theory postulated by Fleisch and Mains,5 SnBr2 should be photoreduced to metallic Sn. We have investigated the photolytic behavior of SnBr2 using several different spectroscopic and gravimetric methods.…”

Section: Discussionmentioning

confidence: 99%

“…Figure5. Ion current difference (probe at 2 cm, probe at 15 cm) in arbitrary units vs glass substrate surface temperature for approximately 20 °C intervals.…”

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Preparation of an iron-nitride film from a molecular tetrairon nitrido cluster

Fehlner¹,

Amini²,

Stickle³

et al. 1990

Chem. Mater.

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The transition metal-main-group atom cluster HFe4(C0)12N has been studied as a potential molecular precursor for the production of thin films that contain amorphous iron nitride phases. Films 300-500 A thick are formed by chemical vapor deposition at 160-180 "C on glass substrates. Analysis by X-ray photoelectron spectroscopy shows =lo% nitrogen and low oxygen and carbon impurities. X-ray diffraction shows the presence of an a-Fe phase. Mossbauer spectoscopy of the purest films confirms the presence of a-Fe and, in agreement with the atomic composition, shows an equally abundant nitride phase which is probably due to 7'-Fe4N. Mass spectrometric analysis of the gas-phase products shows the presence of CO, which is the major gaseous product in the deposition, but low levels of H2, NHs, and C02 are also identified as pyrolysis products of HFe4(C0)12N. The iron nitride film appears to be very similar to that produced by reactive sputtering of iron in argon in the presence of N2 and H2 in a 1:l ratio.

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