To examine the mechanism of film deposition in a planar rf CH4 discharge plasma, measurements were made of the spatial distributions of the deposition rate and optical emission intensity along the discharge axis between parallel electrodes. Optical-absorption properties of the deposited carbon films were also measured over both the infrared and visible regions. To measure the spatial deposition rates, the substrate surface was elevated from the cathode electrode with the use of quartz glass plates. It was found that the spatial properties of films, which were deposited in both the ion-sheath and bulk-plasma regions, differ markedly from each other. The carbon films obtained from within the ion-sheath region were found to be extremely hard, while those obtained in the bulk-plasma region were polymerlike soft films. This disparity was thought to be due to the difference in the kinetic energy of the ions bombarding the substrate surface; that is, the substrate surface potential could be changed by elevating the substrate surface. These results were incorporated in the discussion of the deposition mechanism, with emphasis on the contribution of ion bombardment to the film-deposition process. It was tentatively concluded that the film-deposition rate was predominantly dependent on the product of the ion kinetic energy and ion flux density that reached the substrate surface.

The radio-frequency glow discharges of several kinds of gases were examined to measure the ion sheath thickness at the cathode electrode. At intermediate gas pressures around 0.05– 0.5 Torr, the sheath thickness d depends on the pressure P in the expression P1/2d=K0 for almost all of the discharges examined. It was also pointed out that the constant K0 value decreased linearly against a mass of the predominant ion in the plasma. The discrepancy between the sheath thickness measured in this work and by theoretical solution was discussed for the argon discharge.

The optical emission profile (OEP) between anode and cathode electrodes is examined for monitoring planar rf discharges of H2, N2, and Ar gases. Form the OEP we can easily find the boundary of the ion sheath and the plasma region and accordingly the ion sheath width at the cathode electrode. The plasma parameters are measured by the Langmuir probe method, and the relative mean electron energy Te in H2 and N2 plasmas is found to be evaluated by the ion sheath width ls with a relationship Te∝ls. The plasma density can also be estimated by both the cathode negative potential Vc and ls. A charge-coupled device (CCD) image sensor with a 105-mm macro lens is employed to measure the OEP within a very short time. Although the CCD measurement shows a somewhat deviated OEP, this is very useful to measure the precise ion sheath width.

No abstract

No abstract