Surface coating on the cylinder rod using sputtering deposition method with modulated magnetic field

Abstract

Carbon thin films were prepared on the carbide steel cylinder rod using new magnetron sputtering deposition method to prevent their corrosion and/or increasing friction coefficient. In this method, plasmas move toward axial direction using modulated magnetic field which was generated by low frequency alternating coil current. Experimental results suggest surface roughness of the film decreased to ~10 nm from >100 nm (substrate) by this deposition. Uniformity of the ion saturation current and film thickness increased by modulated magnetic field. Deposition rate of carbon films prepared using RF discharge at 50 W was higher than that using DC discharge at 500 V and 30mA, however hardness of the film prepared by DC discharge was higher than that by RF discharge.

Preparation of metal doped SiO₂ films by magnetron sputtering deposition using metal oxide mixture powder target

“…In addition, the method is safe in order not to use dangerous gas and high energy laser light, compared with the method such as plasma CVD, pulsed laser deposition etc. Because of its versatility, we have been able to develop several kinds of functional thin films, such as tungsten carbide, silicon carbide, chromium carbide, titanium carbide, cubic boron nitride, carbon nitride and silicon nitride using the sputtering deposition method [9][10][11][12][13][14][15][16][17][18][19][20][21][22]. However, it is hard to control metal doping ratio using conventional sputtering deposition method, because high density bulk targets, (>3g/cm 3 and >95% in density) are generally used in the sputtering deposition method.…”

“…We have been applied to the preparation of some functional thin films, for example, ferromagnetic nanocomposite oxide and dielectric sputtered films [12]. We also have been prepared some multi element functional thin films using powder target [9][10][11][12][13][14][15][16][17][18][19][20][21][22]. Bismuth iron garnet (Bi3Fe5O12) films which used for magnet-optics also prepared using Bi and Fe mixed powder target.…”

Preparation of Sn doped SiO₂ films using SiO₂ and SnO₂ mixture powder target by magnetron sputtering deposition

“…We also have been prepared some functional thin films using powder target [12][13][14][15][16][17]. TiO2 thin films, which used for photo-catalyst, were prepared using Ti and TiO2 powder targets by sputtering and PLD methods.…”

Effects of Laser Ablation Plasma Irradiation on the Sterilization of Yeast Fungus and Spore-forming Bacteria

“…The versatility of the PLD method has enabled the development of various functional thin films, such as tungsten carbide, silicon carbide, chromium carbide, titanium carbide, cubic boron nitride, carbon nitride, and silicon nitride. We have also prepared functional thin films under various deposition conditions, such as titanium dioxide (TiO 2 ) and zinc oxide (ZnO) using the PLD method, and all of them showed high quality, including high crystallinity and hardness without substrate heating [11][12][13][14][15][16][17]. In general, it is considered that the degree of ionization at the very close to the target during the early phase of pulsed laser ablation (PLA) plasma should be very high, and the plasma area may be very reactive.…”