2018
DOI: 10.1039/c7cp07812a
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Surface modification effects on defect-related photoluminescence in colloidal CdS quantum dots

Abstract: We investigated the effects of surface modification on the defect-related photoluminescence (PL) band in colloidal CdS quantum dots (QDs). A size-selective photoetching process and a surface modification technique with a Cd(OH)2 layer enabled the preparation of size-controlled CdS QDs with high PL efficiency. The Stokes shift of the defect-related PL band before and after the surface modification was ∼1.0 eV and ∼0.63 eV, respectively. This difference in the Stokes shifts suggests that the origin of the defect… Show more

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Cited by 23 publications
(12 citation statements)
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“…These nanomaterials are photoactive, and potentially could be transformed by photoetching, as observed with other semiconducting nanoparticles. [21][22][23] Thus, it is critical to quantify the amounts of metal ions released from heavy metal-based nanoparticles during exposure to solar simulated irradiation.…”
Section: Introductionmentioning
confidence: 99%
“…These nanomaterials are photoactive, and potentially could be transformed by photoetching, as observed with other semiconducting nanoparticles. [21][22][23] Thus, it is critical to quantify the amounts of metal ions released from heavy metal-based nanoparticles during exposure to solar simulated irradiation.…”
Section: Introductionmentioning
confidence: 99%
“…The intensity-weighted average lifetime was obtained by the following equation . The faster decay component τ 1 is generally associated to the surface traps and the slower decay component τ 2 to the excitonic transition in the InP core [ 36 , 37 , 38 ]. As listed in Table 3 , the average lifetimes are decreasing in the order of QD–OcSH, QD–PBSH, and QD–TP with 32.95 ns, 25.02 ns, and 12.25 ns, respectively.…”
Section: Resultsmentioning
confidence: 99%
“…For XPS measurements, the monolayer structures of CdTe and CdTe/CdS QDs were prepared as follows. 40 The Si substrates were cleaned by immersion in fresh piranha solution (1/3 (v/v) mixture of 30% H2O2 and 98% H2SO4) for 20 min. Subsequently, the substrates were rinsed with water and used immediately after cleaning.…”
Section: Methodsmentioning
confidence: 99%