In published literature, it is widely reported that the plasma treatment and funtionalization with Octadecyltrichlorosilane (OTS) self-assembled monolayer (SAM) can individually alter the wetting properties of SU8 surface. A combination of the two approaches gives better results and the synergism of the two approaches produces a superhydrophobic SU8 surface, which is presented in this work. We have investigated various composition of plasma for treatment of SU8 surfaces and permuted the treated SU8 surfaces with deposition of OTS SAM. In all such synergized experiments, we obtained water contact angle higher than 150 , which is much higher than the one that can be obtained with individual application of the two approaches. The combined approach presented in this work is suitable for bulk production of superhydrophobic surface, and is a mask-less process, which makes it cost effective. The surface topography, wetting, and chemical properties of SU8 surfaces were characterized using the contact angle goniometry, atomic force microscopy, FTIR, Raman, and XPS spectra. The superhydrophobic SU8 surfaces were observed to be stable even after five months.
EXPERIMENTAL
Substrate PreparationSingle side polished p-type silicon wafers (100) were used as substrate. SU8 (Microchem, SU8-2002) negative photo resist were used for experiments. The silicon wafers were cleaned in H 2 SO 4 (98%) and H 2 O 2 (30%) mixture of 3:1 ratio for 15 min to remove organic contaminations. The samples were rinsed thoroughly with DI water followed by drying with nitrogen gas. After cleaning, the SU8 photoresist was spin coated at 500 rpm Additional Supporting Information may be found in the online version of this article.