In this paper we report an application of forward bias, low frequency capacitance measurements in order to relate the electrical properties of the intrinsic material to the solar cell performance after photodegradation and thermal recovery. The capacitance vs. frequency technique (C-v-f) is based on the measurement of the variation of the total charge trapped in the gap defect states of the intrinsic layer during a low frequency voltage perturbation. As expected, after illumination the efficiencies of the tested devices decreased. These variations were found to be only weakly related to the initial electrical performance, but strongly dependent on the initial density of states of the intrinsic layers. Efficiency degradation of the investigated solar cells has been quantitatively related to a reduced mobility-lifetime product and, lesser, to a variation of the density of defects. The defects detected by the C-v-f technique are positioned around 0.55 eV from the band-edge and do not act as recombination centers but, rather, as free carrier traps. Thus, due to their energy position they do not interfere with steady-state current-voltage (I-V) measurements and with recombination mechanisms. Employing either the I-V or the C-v-f technique, a more complete picture of the defect distribution in the gap of a-Si : H has been drawn and the defects behaviour, after light soaking and annealing, has been investigated.