Surface roughening in electrodeposited nickel films on ITO glasses at a low current density

Role of substrate in the surface diffusion and kinetic roughening of nanocrystallised nickel electrodeposits

“…4(a) for the case of Cu. We recently showed that the double linear feature of Ni film on ITO could be ascribed to the range of the J value applied [6,11], as only single linearity has been reported till now with the same substrate at quite low applied current density conditions [2,3]. approach.…”

“…Nowadays, various exotic conductive materials [1][2][3] are also experimented. Usually, their influence is reported from the study of the deposition method effects so that only the film morphology can be examined in that case [4].…”

Role of substrate on topography features of nickel deposited nanostructures

“…In particular, they are almost non-sensitive to external air and humidity, which make them very applicable. Many authors such as Saitou et al [22,23] and also Gomez et al [24] successfully used this substrate in the electrodeposition of Ni and other metals. We here present a comparative study of the scan rate and substrate effects in the three cases for a particular thickness range of well-coalesced films mostly solicited for the fabrication of various modern devices.…”

Analysis of the substrate effect on the nucleation and growth mode of electrodeposited cobalt on copper and graphite electrodes

“…For that reason, the decrease of a(Co) gr from 0.80 to 0.66 with the increase of t bringing its value closer to 0.50 could be a serious indication of a growth process of the same type. Of course, the deviation of a(Co) gr with the decrease of t remains an interesting problem to be clarified, that could be examined in the frame of the textural growth orientation as proposed by Saitou et al [56].…”