Surface-science aspects of plasma-assisted etching

Coburn, J. W.

doi:10.1007/bf00348262

Cited by 47 publications

(22 citation statements)

References 32 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In this way, the surface will become more efficient at trapping incoming radicals, leading to higher deposition rates. [32][33][34] The atomic density of the films was calculated by combining the IBA results with direct measurements of the films thickness by stylus profilometry, which yielded values within the range of 0.7Ϯ0.1ϫ10 23 at/cm 3 . In our case, the ion current density measured at the sample holder increased linearly from 50 to 255 A/cm 2 as the C 2 F 6 flux increased from 0 to 1.6 sccm revealing an increasing contribution of implanted ions in growing film.…”

Section: Resultsmentioning

confidence: 99%

Incorporation of fluorine in hydrogenated silicon carbide films deposited by pulsed glow discharge

Jacobsohn

Afanasyev-Charkin

Cooke

et al. 2004

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

View full text Add to dashboard Cite

show abstract

Section: Resultsmentioning

confidence: 99%

Incorporation of fluorine in hydrogenated silicon carbide films deposited by pulsed glow discharge

Jacobsohn

Afanasyev-Charkin

Cooke

et al. 2004

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

View full text Add to dashboard Cite

show abstract

“…FC plasmas have been the subject of extensive applied and fundamental research to understand the modification of polymers and silicon surfaces. [28][29][30][31][32][33][34] Deposition of FC films can improve the physical properties of inexpensive polymer materials by imparting them with protective, protein resistant, gas semipermeable, low dielectric constant, or unusual optical properties. FC films on polymers have a wide variety of applications in biomaterials, optics, chemical sensors, and electronics.…”

Section: B Role Of Polyatomic Ions In Plasma-surface Modificationmentioning

confidence: 99%

Effect of polyatomic ion structure on thin-film growth: Experiments and molecular dynamics simulations

Wijesundara

Yuan

et al. 2000

Journal of Applied Physics

111

View full text Add to dashboard Cite

The experiments described here examine 25-100 eV CF 3 ϩ and C 3 F 5 ϩ ion modification of a polystyrene ͑PS͒ surface, as analyzed by x-ray photoelectron spectroscopy. The molecular dynamics computer simulations probe the structurally and chemically similar reactions of 20-100 eV CH 3 ϩ and C 3 H 5 ϩ with PS. CF 3 ϩ and C 3 F 5 ϩ each form a distribution of different fluorocarbon ͑FC͒ functional groups on PS in amounts dependent upon the incident ion energy, structure, and fluence. Both ions deposit mostly intact upon the surface at 25 eV, although they also undergo some crosslinking upon deposition. Fragmentation of the two ions increases as the ion energies are increased to 50 eV. Both ions show increases in total fluorine and fluorinated carbon content when changing the ion energy from 25 to 50 eV. The simulations predict that CH 3 ϩ and C 3 H 5 ϩ behave in a similar fashion to their FC analogs, remaining mostly intact and either embedding or scattering from the surface without reacting at 20 eV. At 50 and 100 eV, the simulations predict fragmentation most or all of the time. The simulations also show that the chemical products of the collisions depend significantly on the structure of the incident isomer. The simulations further illustrate how the maximum penetration depth of ion fragments depends on ionic structure, incident energy, and the identity of the penetrating fragment. These ion-surface results are discussed in terms of their possible role in plasmas.

show abstract

“…The C 3 F 5 ϩ ion maintains most of its molecular character at 25 eV, although the kinetic to internal energy transfer is sufficient to fragment at least some of its COC and͞or COF bonds at 50 eV. Polymer films grow most readily from plasma feedgases with F͞C ratio less than ϳ2.5 (6,10). Thus, C 3 F 6 feedgases more readily grow polymer films than CF 4 , C 2 F 6 , or C 3 F 8 (19,58).…”

Section: Figmentioning

confidence: 99%

“…Plasma processing is used to produce biocompatible surfaces for tissue culture plates, contact lenses, medical implants, and other biomedical devices; photoresists for semiconductor lithography; optical coatings; polymer films for packaging and adhesives; semipermeable membranes; and chemical sensors (1)(2)(3)(4)(5)(6). The modification of polymers and silicon surfaces by fluorocarbon plasmas has been particularly well studied from both practical and fundamental standpoints (1,(7)(8)(9)(10)(11)(12)(13). For example, fluoropolymers deposited from plasmas have been examined for use as diffusion barriers in drug delivery systems and vascular implant devices that resist protein fouling (6,14).…”

mentioning

confidence: 99%

See 1 more Smart Citation

Effects of unique ion chemistry on thin-film growth by plasma–surface interactions

Wijesundara

Hanley

et al. 2000

Proc. Natl. Acad. Sci. U.S.A.

View full text Add to dashboard Cite

Plasma processing is a standard industrial method for the modification of material surfaces and the deposition of thin films. Polyatomic ions and neutrals larger than a triatomic play a critical role in plasma-induced surface chemistry, especially in the deposition of polymeric films from fluorocarbon plasmas. In this paper, low energy CF3+ and C3F5+ ions are used to modify a polystyrene surface. Experimental and computational studies are combined to quantify the effect of the unique chemistry and structure of the incident ions on the result of ion-polymer collisions. C3F5+ ions are more effective at growing films than CF3+, both at similar energy/atom of approximately 6 eV/atom and similar total kinetic energies of 25 and 50 eV. The composition of the films grown experimentally also varies with both the structure and kinetic energy of the incident ion. Both C3F5+ and CF3+ should be thought of as covalently bound polyatomic precursors or fragments that can react and become incorporated within the polystyrene surface, rather than merely donating F atoms. The size and structure of the ions affect polymer film formation via differing chemical structure, reactivity, sticking probabilities, and energy transfer to the surface. The different reactivity of these two ions with the polymer surface supports the argument that larger species contribute to the deposition of polymeric films from fluorocarbon plasmas. These results indicate that complete understanding and accurate computer modeling of plasma-surface modification requires accurate measurement of the identities, number densities, and kinetic energies of higher mass ions and energetic neutrals.

show abstract

Surface-science aspects of plasma-assisted etching

Cited by 47 publications

References 32 publications

Incorporation of fluorine in hydrogenated silicon carbide films deposited by pulsed glow discharge

Incorporation of fluorine in hydrogenated silicon carbide films deposited by pulsed glow discharge

Effect of polyatomic ion structure on thin-film growth: Experiments and molecular dynamics simulations

Effects of unique ion chemistry on thin-film growth by plasma–surface interactions

Contact Info

Product

Resources

About