2010
DOI: 10.1016/j.tsf.2010.04.012
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Synthesis and characterization of HfO2 and ZrO2 thin films deposited by plasma assisted reactive pulsed laser deposition at low temperature

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Cited by 41 publications
(20 citation statements)
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“…This wide variation reflects the critical dependence of the optical constants on the deposition technique, thickness, treatment (plasma or bias), annealing temperature and atmosphere, and the analytical technique (ellipsometry or spectrophotometry) used to derive the optical constants. Many studies indicated that the extinction coefficient (k) of zirconium oxide was almost zero in the visible and infrared ranges [2,15]. In our work, we found small values of k, indicating absorption that may be attributed to surface roughness and sub-stoichiometry.…”
Section: Optical Constantssupporting
confidence: 49%
See 1 more Smart Citation
“…This wide variation reflects the critical dependence of the optical constants on the deposition technique, thickness, treatment (plasma or bias), annealing temperature and atmosphere, and the analytical technique (ellipsometry or spectrophotometry) used to derive the optical constants. Many studies indicated that the extinction coefficient (k) of zirconium oxide was almost zero in the visible and infrared ranges [2,15]. In our work, we found small values of k, indicating absorption that may be attributed to surface roughness and sub-stoichiometry.…”
Section: Optical Constantssupporting
confidence: 49%
“…ZrO 2 thin films have been fabricated by pulsed laser deposition (PLD) mostly using the ultraviolet krypton fluoride (KrF) excimer laser. The films were prepared by reactive laser ablation of a pure zirconium target in an oxygen atmosphere [14,15]. Alternatively, ZrO 2 thin films were prepared by PLD using a ZrO 2 ceramic target [16][17][18][19][20].…”
Section: Introductionmentioning
confidence: 99%
“…These different phases can be tailored made in thin films achieve required hardness, refractive index and optical band gap. Various physical deposition techniques such as thermal oxidation of zirconium films [12,13], electron beam evaporation [14][15][16][17], pulsed laser deposition [18,19], vacuum arc deposition [20,21], DC magnetron sputtering [22][23][24][25], RF magnetron sputtering [26][27][28][29][30], molecular beam epitaxy [31], and chemical deposition methods namely, chemical bath deposition [32], spray pyrolysis [33], sol-gel process [34][35][36] and atomic layer deposition [37,38] were employed for the growth of zirconium dioxide thin films. Among these techniques, magnetron sputtering has the advantage in the growth of films on large area substrates and at low substrate temperatures.…”
Section: Introductionmentioning
confidence: 99%
“…Because of its high chemical stability, high cost and high processing temperatures, hafnium oxide is less studied in the form of nanomaterials than other simple oxides. Recently the synthesis of nanocrystalline hafnia by a sol-gel method was reported [12][13][14]. The synthesis of nanocrystalline HfO 2 by the hydrolysis of hafnium oxychloride in ethanol was reported [15].…”
Section: Introductionmentioning
confidence: 99%