Synthesis and in-situ ellipsometric monitoring of Ti/C nanostructured multilayers using a high-current, dual source pulsed cathodic arc

Ryves, L.; Bilek, M.M.M.; Oates, Thomas W.; Tarrant, R.N.; McKenzie, David R.; Burgmann, F. A.; McCulloch, D. G.

doi:10.1016/j.tsf.2004.11.163

Cited by 18 publications

(9 citation statements)

References 13 publications

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“…A system of similar design is described by Ryves et al 10 . In this system a high current arc discharge 2 is repeatedly ignited on a 25 mm diameter cathode by surface flashover between the cathode and a centre trigger electrode, and the arc plasma generated is transported through a 90 • magnetic filter to the substrate.…”

Section: Experimental Methodsmentioning

confidence: 99%

Filtered pulsed cathodic arc deposition of fullerene-like carbon and carbon nitride films

Tucker

Czigány

Broitman

et al. 2014

Journal of Applied Physics

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Carbon and carbon nitride films (CN x , 0 ≤ x ≤ 0.26) were deposited by filtered pulsed cathodic arc and were investigated using transmission electron microscopy and X-ray photoelectron spectroscopy. A 'fullerene-like' (FL) structure of ordered graphitic planes, similar to that of magnetron sputtered FL-CN x films, was observed in films deposited at 175 • C and above, with N 2 pressures of 0 and 0.5 mTorr. Higher substrate temperatures and significant nitrogen incorporation are required to produce similar FL structure by sputtering, which may, at least in part, be explained by the high ion charge states and ion energies characteristic of arc deposition. A gradual transition from majority sp 3 -hybridized films to sp 2 films was observed with increasing substrate temperature. High elastic recovery, an attractive characteristic mechanical property of FL-CNx films, is evident in arc-deposited films both with and without nitrogen content, and both with and without FL structure.

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Section: Experimental Methodsmentioning

confidence: 99%

Filtered pulsed cathodic arc deposition of fullerene-like carbon and carbon nitride films

Tucker

Czigány

Broitman

et al. 2014

Journal of Applied Physics

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“…3,4 It employs a trigger electrode, which is inserted into an alu-mina sleeve located in a hole drilled at the center of the cathode, to ignite the arc spots. 3,4 It employs a trigger electrode, which is inserted into an alu-mina sleeve located in a hole drilled at the center of the cathode, to ignite the arc spots.…”

Section: Methodsmentioning

confidence: 99%

Oriented graphite layer formation in Ti/C and TiC/C multilayers deposited by high current pulsed cathodic arc

Persson

Ryves

Tucker

et al. 2008

Journal of Applied Physics

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“…Use of more than one source More than one arc source is often used to increase the area to be coated and/or to tune film composition [314,315]; using different cathodes, co-deposition can be used for doping [213], or leads to embedded nanoparticle formation [316], alloy-compounds [248], multilayers [317] or nanolaminates [318,319].…”

Section: Deposition In Vacuummentioning

confidence: 99%

A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

Anders

2014

Surface and Coatings Technology

242

109

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High power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come at a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface preparation by metal ion sputtering and phased biasing for film texture and stress control. Therefore, in this review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.

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Synthesis and in-situ ellipsometric monitoring of Ti/C nanostructured multilayers using a high-current, dual source pulsed cathodic arc

Cited by 18 publications

References 13 publications

Filtered pulsed cathodic arc deposition of fullerene-like carbon and carbon nitride films

Filtered pulsed cathodic arc deposition of fullerene-like carbon and carbon nitride films

Oriented graphite layer formation in Ti/C and TiC/C multilayers deposited by high current pulsed cathodic arc

A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

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