Synthesis and properties of UV curable polyvinylsilazane as a precursor for micro‐structuring

Abstract

Photosensitive acrylated polyvinylsilazanes were prepared by reacting a diacrylate containing compound, 1,1-bis (acryloyloxyethyl) ethyl isocyanate (BAEI), with polyvinylsilazane (PVSZ) and utilized as an inorganic photoresist for generating SiCN-based ceramic microstructures. The acrylate-modified polymers (m-PVSZ) were characterized by 1 H-NMR, 13 C-NMR and FT-IR methods to determine the chemical reaction mechanism. Differential photocalorimeter and FT-IR analysis were employed to examine its photosensitive properties. Line patterns were fabricated by a UV nano-imprinting method; multi-layered octagon structures were fabricated by a two-photon absorption stereolithography process. The results indicate that m-PVSZ is quite a novel inorganic photoresist for the fabrication of micro ceramic structures.

Rational Design of Si(B)Cn Microstructures Using Direct Photolithography of Patternable Preceramic Photoresists

“…Several works described the grafting of photocurable functions onto preceramic polymers thus initiating direct patterning of the material through UV crosslinking. PDCs micro-patterning prepared from acrylated or methacrylated preceramic negative photoresists is a strategy already reported in the literature, in particular for SiCN [35][36][37][38][39][40][41][42] or SiOC [43] micro-objects. On the other hand, SiC patterning resulting from micro-stereolithography can be carried out without grafting any photocurable function on the polymer backbone [44].…”

3D Nanofabrication of SiOC Ceramic Structures

“…However, shaping preceramic polymers at the sub‐micrometer scale while generating complex 3D ceramics architecture has been so far unfeasible: scarce examples reported in literature present limitations of poor definition of 3D forms and incomplete ceramization, due to lack of suitable precursors, high shrinkage accompanying the heat treatment, and pyrolysis temperature below the completion of the polymer‐to‐ceramic transformation (heating below 800 °C). Indeed, methods for 3D printing at high resolution typically employ two‐photon lithography (2PL), triggering polymerization of a photosensitive resists .…”