“…The possibility of material nanoprocessing based on femtosecond laser pulse ablation (i.e., material ejection from the irradiated sample [1]) was first shown in [2,3]. Subsequently, several femtosecond laser techniques have been developed for surface nanostructuring such as the mask projection technique [4], near-field ablation [5][6][7][8], laser-assisted chemical etching [9], nanotexturing by deposition from a femtosecond laser ablation plume [10][11][12][13][14], nanostructuring of thin metal films by femtosecond laser-induced melt [15][16][17], plasmonic nanoablation [18], direct femtosecond laser ablation [14,19,20], and interferometric femtosecond laser ablation [21][22][23][24][25][26]. In a number of studies, it was found that laser-induced periodic surface structures (LIPSS) that had previously been generated using long pulse lasers [27][28][29][30][31][32][33] can be also produced by femtosecond laser pulses on semiconductors [34][35][36][37], glasses [38,39], metals [14,[40]…”