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Rights © Tsinghua University Press and Springer-Verlag Berlin Heidelberg2017. This is a pre-print of an article published in Nano Research. and/or interfacial manipulation. An "epitaxial defect transfer" process and catalyst-nanowire interfacial engineering is employed to induce twin defects parallel and perpendicular to the nanowire growth axis. By inducing and manipulating twin boundaries in the metal catalysts, twin formation and density is controlled in Ge nanowires. The formation of Ge polytypes is also observed in nanowires for the growth of highly dense lateral twin boundaries.Additionally, metal impurity, in the form of Sn, is injected and engineered via third-party metal catalysts resulting above-equilibrium incorporation of Sn adatoms in Ge nanowires. Sn impurities are precipitated into Ge bi-layers during Ge nanowire growth, where the impurity Sn atoms become trapped with the deposition of successive layers, thus giving an extraordinary Sn content (> 6 at.%) in the Ge nanowires. A larger amount of Sn impingement (> 9 at.%) is further encouraged by the utilising eutectic solubility of Sn in Ge along with the impurity trapping.