2019
DOI: 10.3390/nano9030476
|View full text |Cite
|
Sign up to set email alerts
|

Tantalum Oxynitride Thin Films: Assessment of the Photocatalytic Efficiency and Antimicrobial Capacity

Abstract: Tantalum oxynitride thin films have been deposited by reactive magnetron sputtering, using a fixed proportion reactive gas mixture (85% N2 + 15% O2). To produce the films, the partial pressure of the mixture in the working atmosphere was varied. The characteristics of the produced films were analyzed from three main perspectives and correspondent correlations: the study of the bonding states in the films, the efficiency of photo-degradation, and the antibacterial/antibiofilm capacity of the coatings against Sa… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

2
27
0

Year Published

2020
2020
2024
2024

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 44 publications
(29 citation statements)
references
References 71 publications
2
27
0
Order By: Relevance
“…Lastly, a tentative, non-quantitative comparison for the photodegradation of methylene orange between our results and a recent study in [46] can provide a clue on the efficiency of TaON films under visible light. Our results indicate that TaON by 0.5-1.5 sccm O2 degrades 14 to 29.5% of methylene orange, while it is reported around 10% for TaON under partial pressure 0.02-0.24 Pa of 85%N2 + 15%O2 gas mixture.…”
Section: Electrical and Optical Characters Comparisonsupporting
confidence: 60%
See 2 more Smart Citations
“…Lastly, a tentative, non-quantitative comparison for the photodegradation of methylene orange between our results and a recent study in [46] can provide a clue on the efficiency of TaON films under visible light. Our results indicate that TaON by 0.5-1.5 sccm O2 degrades 14 to 29.5% of methylene orange, while it is reported around 10% for TaON under partial pressure 0.02-0.24 Pa of 85%N2 + 15%O2 gas mixture.…”
Section: Electrical and Optical Characters Comparisonsupporting
confidence: 60%
“…The gap between the two bands is within 1.87-2.08 eV. The amorphous tantalum oxynitride (Ta-O-N) films in [38] [46]. In fact, most tantalum oxynitrides have bandgaps between 1.9 and 2.5 eV [1, 3,47].…”
Section: Electrical and Optical Characters Comparisonmentioning
confidence: 99%
See 1 more Smart Citation
“…Metal nitride, oxynitride, and nitrogen‐doped materials have been intensively investigated for various applications including pigments, [1] antimicrobial capacities, [2] electrodecatalysts, [3] dielectrics, [4] optoelectronic materials, [5] and photocatalysts. As photocatalysts, particularly d0‐ or d10‐type oxynitride based on Ti 4+ , Nb 5+ , Ta 5+ , Zn 2+ , and Ga 3+ have band gape energy of 1.8‐2.1 eV, which absorb visible light at 600 to 700 nm, have been widely studied as a promising candidate for solar H 2 generation [6] .…”
Section: Figurementioning
confidence: 99%
“…In the studies carried out in [1][2][3][4][5], the formation of coatings from ternary oxynitride structures TaO x N y was performed by the method of reactive magnetron sputtering at different flows of reactive gases, Oxygen and Nitrogen. In [1] photocatalytic and antibacterial properties of tantalum oxynitride obtained by the method of RF magnetron sputtering was investigated. In [2], the multiphase structure of stable (Ta 2 N, Ta 3 N 5 ) and metastable (TaN, Ta 4 N 5 , Ta 3 N 4 ) tantalum nitride compounds and its corrosion resistance were studied.…”
Section: Introductionmentioning
confidence: 99%