2018
DOI: 10.1016/j.jallcom.2018.04.262
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Temperature-and thickness -dependent dynamic magnetic properties of sputtered CoFeB/Ta bilayer films

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Cited by 29 publications
(19 citation statements)
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“…4(a). For each thickness, we find that temperature has a weak influence on the mean effective damping parameter and that it is essentially constant in the temperature range 0-400 K. This observation is consistent with experimental studies [33,34]. From our statistical samples of the relaxation dynamics, we fit a Gaussian distribution to determine the scatter in the effective damping parameter.…”
Section: B the Temperature Dependence Of The Effective Damping Constantsupporting
confidence: 87%
“…4(a). For each thickness, we find that temperature has a weak influence on the mean effective damping parameter and that it is essentially constant in the temperature range 0-400 K. This observation is consistent with experimental studies [33,34]. From our statistical samples of the relaxation dynamics, we fit a Gaussian distribution to determine the scatter in the effective damping parameter.…”
Section: B the Temperature Dependence Of The Effective Damping Constantsupporting
confidence: 87%
“…(i) It is not present in those CoFeB similarly grown on Pt buffer layer (see Figure S1). Moreover, the eas y -axis redirection arises at the 3 nm thick CoFeB, suggesting the critical FM thickness ( t cr ) for achieving PMA in CoFeB/2D MoSe 2 is ≥3 nm, more than double the values in common systems such as CoFeB/MgO and CoFeB/Ta (≤1.5 nm). Here, t cr is defined as t cr = −2 K i / K b (where K i is the interface contribution and K b is the bulk contribution to the effective magnetic anisotropy energy), above which the PMA will disappear. Hence, the large t cr suggests large interface anisotropy energy and allows for the PMA development in a broad thickness range of CoFeB grown on epitaxial MoSe 2 .…”
Section: Resultsmentioning
confidence: 99%
“…1(e). The values of α is found to be enhanced in CFB (4nm), which is expected due to the enhanced in surface scattering contribution at lower CFB thickness [36] [37] . It is seen that the values of α do not change beyond the 8 nm thickness of CFB thin film grown over Si substrates.…”
Section: Elemental Analysismentioning
confidence: 64%