The resistivity change due to electron spin resonance (ESR) absorption is investigated in a highmobility two-dimensional electron system formed in a Si/SiGe heterostructure. Results for a specific Landau level configuration demonstrate that the primary cause of the ESR signal is a reduction of the spin polarization, not the effect of electron heating. The longitudinal spin relaxation time T1 is obtained to be of the order of 1 ms in an in-plane magnetic field of 3.55 T. The suppression of the effect of the Rashba fields due to high-frequency spin precession explains the very long T1. 73.21.Fg, 72.25.Rb, Electron spin in semiconductor devices has recently attracted much attention in the context of the quantum computation and spintronics application [1]. Electron spin resonance (ESR) is a promising technique to manipulate spins directly, and electrical detection via a change in resistivity is preferable for the read out of the local spin states. However, the origin of the resistivity change due to ESR absorption has not been established. In previous works performed on GaAs two-dimensional electron systems (2DESs) in high magnetic fields [2,3,4,5], the sign of the change ∆ρ xx in longitudinal resistivity ρ xx was found to be the same as that of the derivative of ρ xx with respect to temperature T and the effect of electron heating has not been excluded.For fabricating spintronics devices, silicon appears to be a very suitable host material. Addition to the compatibility with the fabrication technology of integrated circuits, it has the advantage of long electron spin relaxation times due to weak spin-orbit interactions and poor electron-nuclear spin (hyperfine) coupling. Recently, low magnetic field (≃ 0.3 T) ESR measurements have been performed in silicon 2DESs formed in Si/SiGe heterostructures [6,7,8,9]. Both the longitudinal spin relaxation time T 1 and the transverse spin relaxation time T 2 were measured to be of the order of 1 µs and were discussed in terms of the D'yakonov-Perel' spin relaxation mechanism [10] due to the Rashba fields [11].In this Letter, we report electrically detected ESR measurements on a high-mobility silicon 2DES in a magnetic field of 3.55 T. Negative ∆ρ xx clearly observed for a specific Landau level (LL) configuration in a tilted magnetic field demonstrates that the ESR signal is mainly caused by a reduction of the spin polarization P , not by the electron heating effect. For a quantitative discussion, measurements were also performed in the magnetic field B applied parallel to the 2D plane. The T -dependence of the ESR signal is well reproduced with T -independent spin relaxation times. From the amplitude of the ESR signal, T 1 is estimated to be of the order of 1 ms whereas T 2 deduced from the linewidth is about 10 ns. The enhancement of T 1 is explained by the suppression of the effect of the Rashba fields due to high-frequency spin precession.We used a heterostructure sample with a 20-nmthick strained Si channel sandwiched between relaxed Si 0.8 Ge 0.2 layers [12]. The 2D elec...