2005
DOI: 10.1016/j.jcrysgro.2004.09.073
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Temperature dependence of the growth morphology in molecular beam epitaxy grown MnAs

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Cited by 4 publications
(2 citation statements)
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“…In a study of interfacial properties of MnAs/GaAs/MnAs epilayers on GaAs(111)B substrates, Garcia et al [22] demonstrated the absence of interfacial reactions (within the resolution of the experiment) for a growth temperature of 220 • C by x-ray photoemission spectroscopy. Interdiffusion was found when the temperature reached 300 • C. A degradation of the interface morphology above 300 • C due to interdiffusion was also reported for MnAs/GaAs(001) films [102].…”
Section: Mismatch Accommodation Mechanismsupporting
confidence: 59%
“…In a study of interfacial properties of MnAs/GaAs/MnAs epilayers on GaAs(111)B substrates, Garcia et al [22] demonstrated the absence of interfacial reactions (within the resolution of the experiment) for a growth temperature of 220 • C by x-ray photoemission spectroscopy. Interdiffusion was found when the temperature reached 300 • C. A degradation of the interface morphology above 300 • C due to interdiffusion was also reported for MnAs/GaAs(001) films [102].…”
Section: Mismatch Accommodation Mechanismsupporting
confidence: 59%
“…Basically, a (2 Â 4) RHEED pattern was observed during the growth of high-temperature (In, Al)As buffer layers, while it changed to (1 Â 1) or (1 Â 2) during and after the growth of (In, Al, Mn)As layer, implying a two-dimensional growth mode. Had the Mn flux or the substrate temperature been too high, a complicated RHEED pattern would have appeared, implying the formation of a second phase on the sample surface [17].…”
Section: Methodsmentioning
confidence: 99%