Abstract:The Fraunhofer Institute for Photonic Microsystems (IPMS) develops and fabricates MOEMS micro-mirror arrays for a variety of applications in image generation, wave-front correction and pulse shaping. In an effort to extent the application range, mirrors are being developed that withstand higher light intensities. The absorbed light generates heat. Being suspended on thin hinges, and isolated from the bulk by an air gap, the mirrors heat up. Their temperature can be significantly higher than that of their subst… Show more
The Fraunhofer Institute for Photonic Microsystems (Fraunhofer IPMS) develops spatial light modulators (SLMs) based on arrays of tiltable micro mirrors on a semiconductor chip. Typical applications are pattern generation for deep UV-laser mask writing or structured illumination in microscopy. Development and optimization of such SLMs requires detailed knowledge of the device behaviour under operating conditions. Here, the flatness of each single mirror effects the image resolution and contrast of the generated pattern and is amongst others a characteristic property of SLMs. In this context a surface topography measurement under laser exposure (in situ) was designed. The interferometric setup uses the phase-shift principle and allows a resolution in z-direction in the single-digit nanometer range. During irradiation with UV-laser light at 248 nm (KrF) and energy densities of up to 20 mJ/cm 2 the change in single micro-mirrors topography was detected in situ. Measurements with varying pulse energies were carried out to identify an impact on the device performance. In general, the setup is neither limited to a specific illumination wavelength nor to micro-mirrors as structures under test
The Fraunhofer Institute for Photonic Microsystems (Fraunhofer IPMS) develops spatial light modulators (SLMs) based on arrays of tiltable micro mirrors on a semiconductor chip. Typical applications are pattern generation for deep UV-laser mask writing or structured illumination in microscopy. Development and optimization of such SLMs requires detailed knowledge of the device behaviour under operating conditions. Here, the flatness of each single mirror effects the image resolution and contrast of the generated pattern and is amongst others a characteristic property of SLMs. In this context a surface topography measurement under laser exposure (in situ) was designed. The interferometric setup uses the phase-shift principle and allows a resolution in z-direction in the single-digit nanometer range. During irradiation with UV-laser light at 248 nm (KrF) and energy densities of up to 20 mJ/cm 2 the change in single micro-mirrors topography was detected in situ. Measurements with varying pulse energies were carried out to identify an impact on the device performance. In general, the setup is neither limited to a specific illumination wavelength nor to micro-mirrors as structures under test
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