Texturing effects in molybdenum and aluminum nitride films correlated to energetic bombardment during sputter deposition

Drüsedau, T.; Koppenhagen, Kay; Bläsing, J.; John, Thomas-Maik

doi:10.1007/s003390100812

Cited by 19 publications

(3 citation statements)

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“…In figure 7, the compressive stress increases gradually with increasing F N 2 . Drüsedau et al [35] have demonstrated that in a nitride sputtering mode (nitride formed on the surface of the target) the total irradiation energy per deposited atom increases significantly with increasing N 2 flow rate during reactive sputtering deposition of AlN, which has also been observed in reactive sputtering deposition of TiN [37]. Correspondingly, the same phenomenon may take place in this work.…”

Section: Deposition Rate and Issupporting

confidence: 81%

“…As F N 2 increases from 5 to 60 sccm, the deposition rate decreases gradually and reaches a minimum value of 0.14 nm s −1 at F N 2 = 60 sccm. A similar trend has been observed in reactive sputtering Nb [16], Ta [34] or Al [35] target in discharging a mixture of N 2 and Ar gas. which at a constant current, the target voltage increases with an increase in F N 2 .…”

Section: Deposition Rate and Microstructuresupporting

confidence: 80%

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Effects of nitrogen flow rate on the preferred orientation and phase transition for niobium nitride films grown by direct current reactive magnetron sputtering

Wen¹,

Hu²,

Zhao³

et al. 2008

J. Phys. D: Appl. Phys.

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We deposit niobium nitride (NbN) thin films on Si(1 0 0) substrates using direct current (dc) reactive magnetron sputtering in discharging a mixture of N2 and Ar gas, and explore the effects of nitrogen flow rate ( ) on the preferred orientation (PO), phase transition and mechanical properties for the obtained films by virtue of x-ray diffraction and nanoindentation measurements. We find that with increasing the biaxial compressive stress increases, which leads to a pronounced change in the PO and phase structure for the film. A phase transition from δ (face-centred cubic) to δ′ (hexagonal) occurs in the film as the biaxial stress increases to a critical value of about 3.9 GPa, which can be attributed to a decrease in the strain energy. With a further increase in the biaxial stress, the fraction of the δ′ phase in the film increases, and finally the film only has a single phase, δ′-NbN, resulting in a consistent increase in hardness.

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Section: Deposition Rate and Issupporting

confidence: 81%

Section: Deposition Rate and Microstructuresupporting

confidence: 80%

Effects of nitrogen flow rate on the preferred orientation and phase transition for niobium nitride films grown by direct current reactive magnetron sputtering

Wen¹,

Hu²,

Zhao³

et al. 2008

J. Phys. D: Appl. Phys.

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“…24 Mo is also used as a back contact for advanced solar cell assemblies. The method presented in the present paper is applied to molybdenum ͑Mo͒ films.…”

Section: Introductionmentioning

confidence: 99%

Nucleation, growth, percolation, and amorphous to crystalline transition of ultrathin molybdenum films

Nayak

Lodha

Nandedkar

2006

Journal of Applied Physics

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We report on the nucleation, growth, percolation, and crystalline transition of ultrathin layers of molybdenum deposited on float glass substrate by in situ electrical properties. The transition from insulating to metallic state (I-M) is shown as a function of molybdenum film thickness and sheet resistance. In the island growth regime, the electrical conductance (G) has two exponential dependencies on thickness (t), namely, logG−B1∝t and logG−B2∝t, explained as the anisotropic and isotropic growth of islands, respectively. In the I-M transition region, the electrical conductance of the films follows the scaling law G∝(t−tc)q. The value of critical exponent q determined from the present experiments agrees well with the theoretically predicted values for the critical exponent of conductivity in a two-dimensional percolating system. The amorphous to crystalline transition is also observed. The microscopic picture of film growth, derived from in situ sheet resistance measurements shows good agreement with that predicted by the percolation theory.

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The effect of energy and momentum transfer during magnetron sputter deposition of yttrium oxide thin films

Xia

Liang

Miao

et al. 2018

Applied Surface Science

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Texturing effects in molybdenum and aluminum nitride films correlated to energetic bombardment during sputter deposition

Cited by 19 publications

References 1 publication

Effects of nitrogen flow rate on the preferred orientation and phase transition for niobium nitride films grown by direct current reactive magnetron sputtering

Effects of nitrogen flow rate on the preferred orientation and phase transition for niobium nitride films grown by direct current reactive magnetron sputtering

Nucleation, growth, percolation, and amorphous to crystalline transition of ultrathin molybdenum films

The effect of energy and momentum transfer during magnetron sputter deposition of yttrium oxide thin films

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