Three-dimensional integrated circuits (3D-ICs), which contain multiple layers of active devices, have the potential to dramatically enhance chip performance, functionality, and device packing density. They also provide for microchip architecture and may facilitate the integration of heterogeneous materials, devices, and signals and offer a promising solution for reducing both silicon footprint and interconnect length without shrinking the transistors. However, before these advantages can be realized, key technology and CAD challenges of 3D-ICs must be addressed. More specifically, the process required to build circuits with multiple layers of active devices and CAD tools used for design and validation of such circuits. Several such methodologies and CAD tools associated with the design fabrication of 3-D ICs are discussed in this chapter. Few successful 3D-IC design methods and CAD tools and benefits of applying 3D design to the future reconfigurable systems are also discussed in this chapter.
IntroductionThe ongoing demand for greater functionality resulting in multiple IC products, longer off-chip interconnects ravage the performance of microelectronic systems. The advent of System-on-Chip (SoC) in the mid 1990s primarily addressed the increasing delay of the off-chip interconnects. Integrating all of the components on a monolithic substrate enhances the overall speed of the system, while decreasing the power consumption. To assimilate disparate technologies, however several difficulties must be surmounted to achieve high yield for the entire system. Additional system requirements for the radio frequency (RF) circuitry, passive elements, and discrete components, such us decoupling capacitors, which are not easily integrated due to performance degradation or size limitations. While Moore's law [1] and the pursuit of ever increasing transistor counts is well known in IC design and manufacturing circles, what is seldom brought to light for others, are the escalating cost and technology challenges associated with this pursuit. Smaller transistors and larger dies have been reasonable answer to this quest in the past. Stacked dies using wire bond connections and flip-chips have even been employed to create system-in-package (SiP) solutions that meet the needs of some. Looking for alternative solutions for next generation designs, that meet the performance, integration, form-factor, manufacturability, and cost requirements, may have begun to look at going up rather than out. With this trend, the Three-dimensional (3D) integration using through-silicon via (TSV) technology has gained much attention. Once the domain of specialist applications, more mainstream users, such as memories, microprocessors ans specialized logic designs are now being considered as TSV candidates. The advantages of 3D-IC integration are better electrical performance, low power consumption, lower area and weight and high performance (Fig. 2.1).
Opportunities for Three-Dimensional IntegrationPerformance requirements such as increased band...