2002
DOI: 10.1063/1.1445865
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The characterization of a magnetron-sputter-type negative-ion source

Abstract: Characteristics of an 8-in.-diam magnetron-sputter-type negative-ion source (MSNIS) were investigated. A negative sputtered ion beam is generated by a cesium-induced sputter type secondary negative-ion beam emission process. The plasma properties were obtained using a cylindrical Langmuir probe method. The measured electron temperature was approximately 2–5 eV, while the plasma density and plasma potential were of the order of 1011–1012 cm−3 and 5–20 V, respectively, depending on the pressure and power. A reta… Show more

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Cited by 15 publications
(3 citation statements)
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“…The most common methods are the FC and the RFA. The drivers for the use and optimization of these electrostatic ion-probes are often related to applications in plasma processing like ion beam assisted deposition [125,126], plasma ion implantation [127,128] or magnetron sputtering [129][130][131], but also in space applications like ion or plasma thrusters [132][133][134]. In space plasmas, the flux of solar wind ions is measured with FCs [135].…”
Section: Diagnostics With Faraday Cups and Retarding Field Analyzersmentioning
confidence: 99%
“…The most common methods are the FC and the RFA. The drivers for the use and optimization of these electrostatic ion-probes are often related to applications in plasma processing like ion beam assisted deposition [125,126], plasma ion implantation [127,128] or magnetron sputtering [129][130][131], but also in space applications like ion or plasma thrusters [132][133][134]. In space plasmas, the flux of solar wind ions is measured with FCs [135].…”
Section: Diagnostics With Faraday Cups and Retarding Field Analyzersmentioning
confidence: 99%
“…However, in this investigation the target is biased positive and hence called as anode. Paik and Kim,9 Kim and Lee,10, and Oks11 had also used the planar magnetron to develop a negative ion source. They had used the magnetron in the normal mode of operation, i.e., biasing the target negative and not in reverse polarity as done in the present investigation.…”
Section: Introductionmentioning
confidence: 99%
“…For many years, sputtering has been a standard thin film production technique. [1][2][3] However, due to various technological requirements, the development of novel sputtering configurations maintains a high priority. One example is the search for sputtering sources for ferromagnetic alloys/oxides in which specific difficulties occur when standard magnetron sources are used.…”
Section: Introductionmentioning
confidence: 99%