2015
DOI: 10.1021/cr500427p
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The Chemistry of Xenon(IV)

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Cited by 62 publications
(57 citation statements)
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“…The noble gas chemistry-particularly that of xenon and krypton, and including organoxenon chemistry (Naumann and Tyrra 1989;Frohn and Jakobs 1989)-has flourished since 1962 (Christe and Wilson 1982;Christe et al 1991;Dixon et al 2007), and even argon has proved to form a stable chemical compound, HArF, at sufficiently low temperatures (Khriachtchev et al 2000)-it remains the only isolated chemical compound of argon. Consequently, with over half a thousand of currently known compounds of noble gases, their chemistry has been extensively reviewed during the last three decades (Laszlo and Schrobilgen 1988;Lehmann et al 2002;Schrobilgen and Moran 2003;Grochala 2007;Grochala et al 2011;Brock et al 2013;Hope 2013;Haner and Schrobilgen 2015). Moreover, the experimental and theoretical chemistry and physics of noble gas compounds at high pressure started to flourish (Kim et al 2010;Kurzydłowski et al 2011;Dong et al 2017;Zhu et al 2013Zhu et al , 2014 Table of… and Schwerdtfeger 2014; Li et al 2015;Dewaele et al 2016;Kurzydłowski and ZaleskiEjgierd 2016), following the preliminary exploration a decade ago (Grochala 2007).…”
mentioning
confidence: 99%
“…The noble gas chemistry-particularly that of xenon and krypton, and including organoxenon chemistry (Naumann and Tyrra 1989;Frohn and Jakobs 1989)-has flourished since 1962 (Christe and Wilson 1982;Christe et al 1991;Dixon et al 2007), and even argon has proved to form a stable chemical compound, HArF, at sufficiently low temperatures (Khriachtchev et al 2000)-it remains the only isolated chemical compound of argon. Consequently, with over half a thousand of currently known compounds of noble gases, their chemistry has been extensively reviewed during the last three decades (Laszlo and Schrobilgen 1988;Lehmann et al 2002;Schrobilgen and Moran 2003;Grochala 2007;Grochala et al 2011;Brock et al 2013;Hope 2013;Haner and Schrobilgen 2015). Moreover, the experimental and theoretical chemistry and physics of noble gas compounds at high pressure started to flourish (Kim et al 2010;Kurzydłowski et al 2011;Dong et al 2017;Zhu et al 2013Zhu et al , 2014 Table of… and Schwerdtfeger 2014; Li et al 2015;Dewaele et al 2016;Kurzydłowski and ZaleskiEjgierd 2016), following the preliminary exploration a decade ago (Grochala 2007).…”
mentioning
confidence: 99%
“…Xenon octafluoride with oxidation state VIII is a source of contention as to its isolability under any set of experimental conditions [11][12][13]. With chlorine, sulfur forms only the dichloride and the thermally labile tetrachloride [14]; chlorine forms the monochloride [dare we use the name, or even the descriptor chlorine(I) chloride for Cl 2 ]; iodine forms the trichloride with an early suggestion of the pentachloride [15]; finally, xenon forms the fragile tetrachloride [16,17]. With bromine, sulfur forms the dibromide, and chlorine and bromine form the monobromide [again, dare we refer to BrCl as chlorine(I) bromide or even use the formula ClBr].…”
Section: Formation Of Binary Compoundsmentioning
confidence: 99%
“…With its lowest first ionization potential (12.13 eV) xenon forms numerous compounds in which it adopts oxidation states +1/2, +2, +4, +6 and +8 [1][2][3][4][5][6]. The relatively large thermodynamic and/or kinetic stability of these species enabled characterization of over 150 crystal structures for Xe-bearing systems.…”
Section: Introductionmentioning
confidence: 99%
“…In contrast to xenon difluoride (XeF 2 ), KrF 2 is thermodynamically unstable (∆H f = 60.2 kJ mol −1 , at 93 • C [16]) and thus hard to synthesize and handle. Higher fluorides of krypton (KrF 4 , KrF 6 ) are not known (initial reports of the synthesis of KrF 4 [10,11] have never been confirmed), again in contrast to xenon which does form both XeF 4 and XeF 6 . Despite the mediocre reactivity of krypton a substantial number of compounds and complexes containing this element were speculated to exist in the gas phase [17][18][19][20][21][22][23].…”
Section: Introductionmentioning
confidence: 99%