The complete acquisition of the topography of a special multi-mirror arrangement with the help of a Fizeau interferometer

Xu, He‐Xiu; Müller, Andreas Michael; Balzer, Felix; Percle, B; Manske, Eberhard; Jäger, Gerd

doi:10.1117/12.823484

Cited by 3 publications

(6 citation statements)

References 5 publications

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“…Finally, if the calibration protocols cannot be trusted, we must measure the profile deviation of the standard mirror in the later mounting set-up to reduce this systematic error in the INP. At the Institute of Process Measurement and Sensor Technology we have been using several set-ups of the so called three-flat test [4]. First seriously published by [7], it consists of a combination of measurements between three different flats.…”

Section: Perspectivesmentioning

confidence: 99%

“…To be able to correct the systematic error resulting from shape deviations of a mirror, it is necessary to determine these deviations with high precision and to take measures to keep them invariant. Therefore the Institute of Process Measurement and Sensor Technology at the Ilmenau University of Technology has been conducting research on several approaches to measuring shape deviations, such as using image-based [4] and point-based scanning methods [5].…”

Section: Introductionmentioning

confidence: 99%

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Interferometric measurement of profile deviations of large precision mirrors

2011

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In numerous interferometric applications of nanopositioning and nanomeasuring technology, plane mirrors are used as flatness or straightness standards for the movement of a positioning device. During this process, the shape deviations of the mirrors used lead to systematic errors of the position measurements, which can be corrected in later applications if known. Most often the effective shape deviations are described sufficiently well by profile deviations along a profile line which is fixed by the movement of the positioning or measuring device.The novel precision device -a so-called interferometric nanoprofilometer -for measuring the profile deviations of plane mirrors presented in this paper is based on the comparison of the profile line of the mirror to be tested with a straightness standard embodied by a mirror of very high flatness. A specially designed point-based measuring interferometer is moved along the profile line. As the measurement is directly referenced to the straightness standard, the influence of the guide errors was greatly reduced. The uniform movement of the interferometer is ensured through a linear measurement table, which is driven using speed control and pulse-width modulation. Apart from the mechanical and optical design of the interferometric nanoprofilometer, a hardware module was assembled which enables the control of the linear measurement table and the extraction of pulses for the synchronous acquisition of position and profile deviation values. In addition, a software tool was developed for configuring the measurement process and for data recording as well as a program to perform various analyses of the profile deviations.In measurements performed with the interferometric nanoprofilometer covering the maximum scanning length with lx=250 mm under laboratory conditions, the expanded uncertainty was U(l)=7.8 nm at a confidence level of p=95% (k=2).

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Section: Perspectivesmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Interferometric measurement of profile deviations of large precision mirrors

2011

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“…The flatness deviations in the individual surfaces and the orthogonality deviations between the surfaces are measured and corrected algorithmically. Intensive investigations have been carried out to reduce the measurement uncertainty of this correction procedure [5,15].…”

Section: Basic Measurement Approachmentioning

confidence: 99%

Recent developments and challenges of nanopositioning and nanomeasuring technology

Manske

Jäger

Hausotte

et al. 2012

Meas. Sci. Technol.

162

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Rapid progress in several high-tech industries has significantly increased the need for dimensional micro- and nano-metrology. Structures to be measured are becoming more complex with smaller structure widths and higher aspect ratios in increasingly larger surface regions and potentially highly curved surfaces. Significant international effort can be seen to develop high-capacity measuring machines with nanometre precision in growing measuring ranges up to hundreds of millimetres. This paper begins with an outline of the requirements stemming from high-tech developments currently being done or expected in the future and discusses recent developments in the field of nanopositioning and nanomeasuring technology with respect to basic measurement approaches, laser interferometer systems. The large range of nanoprobe systems usable in nanomeasuring machines is discussed, such as optical focus sensors, white light interferometer microscopes, CCD camera microscopes using the depth from the focus method, tactile stylus probes, atomic force microscopes (AFMs) and 3D microprobes. The versatile properties of these sensors allow the machine to be used in many different metrological applications. The paper also introduces a multi-sensor approach using a microscope revolver. It concludes with an illustration of metrologically challenging measurements, e.g., scanning micro-structures of curved optical surfaces or performing AFM scans of very large regions with significant data volume.

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“…However, to determine the shape deviation of the standard mirror, it is possible to measure against a selfaveraging surface, or more common practice is to use the socalled three-flat test. At the Institute of Process Measurement and Sensor Technology we have been using several set-ups of the three-flat test [4]. First seriously published by Schulz [8], it consists of a combination of face-to-face measurements between three different flats.…”

Section: Uncertainty Of the Standard Mirrormentioning

confidence: 99%

“…To be able to correct the systematic errors resulting from shape deviations of a mirror, it is necessary to determine these deviations with high precision and to take measures to keep them invariant. Therefore, the Institute of Process Measurement and Sensor Technology at the Ilmenau University of Technology has been conducting research on several approaches to measuring shape deviations, such as using image-based [4] and point-based scanning methods [5].…”

Section: Introductionmentioning

confidence: 99%

Approaching nanometre accuracy in measurement of the profile deviation of a large plane mirror

Müller¹,

Hofmann²,

Manske³

2012

Meas. Sci. Technol.

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The interferometric nanoprofilometer (INP), developed at the Institute of Process Measurement and Sensor Technology at the Ilmenau University of Technology, is a precision device for measuring the profile deviations of plane mirrors with a profile length of up to 250 mm at the nanometre scale. As its expanded uncertainty of U(l) = 7.8 nm at a confidence level of p = 95% (k = 2) was mainly influenced by the uncertainty of the straightness standard (3.6 nm) and the uncertainty caused by the signal and demodulation errors of the interferometer signals (1.2 nm), these two sources of uncertainty have been the subject of recent analyses and modifications. To measure the profile deviation of the standard mirror we performed a classic three-flat test using the INP. The three-flat test consists of a combination of measurements between three different test flats. The shape deviations of the three flats can then be determined by applying a least-squares solution of the resulting equation system. The results of this three-flat test showed surprisingly good consistency, enabling us to correct this systematic error in profile deviation measurements and reducing the uncertainty component of the standard mirror to 0.4 nm. Another area of research is the signal and demodulation error arising during the interpretation of the interferometer signals. In the case of the interferometric nanoprofilometer, the special challenge is that the maximum path length differences are too small during the scan of the entire profile deviation over perfectly aligned 250 mm long mirrors for proper interpolation and correction since they do not yet cover even half of an interference fringe. By applying a simple method of weighting to the interferometer data the common ellipse fitting could be performed successfully and the demodulation error was greatly reduced. The remaining uncertainty component is less than 0.5 nm. In summary we were successful in greatly reducing two major systematic errors. The interferometric nanoprofilometer in this machine generation is a precision device for laboratory use, able to measure profile deviations of 250 mm long profiles with an expanded combined standard uncertainty of 2.5 nm at a confidence level of p = 95% (k = 2).

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The complete acquisition of the topography of a special multi-mirror arrangement with the help of a Fizeau interferometer

Cited by 3 publications

References 5 publications

Interferometric measurement of profile deviations of large precision mirrors

Interferometric measurement of profile deviations of large precision mirrors

Recent developments and challenges of nanopositioning and nanomeasuring technology

Approaching nanometre accuracy in measurement of the profile deviation of a large plane mirror

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