High-precision metrology has emerged as an enabling technology for modern key technologies. Therefore, at the Technische Universität Ilmenau, a new nanopositioning and nanomeasuring machine NPMM-200 with a measuring range of 200 mm × 200 mm × 25 mm, and a resolution of 0.02 nm was developed. The machine represents the great improvement of the extended threedimensional Abbe comparator principle to achieve nanometre accuracy. All six degrees of freedom of the mirror plate with the measuring object are measured by fibre-coupled laser interferometers, the signals of which are then used together with the probe system signals for a high-precision position and orientation control and surface and coordinate measurements. This paper presents the metrological concept, the realized design as well as the metrological parameters.

Over the past decade a trend of component miniaturization can be observed both in industry and in the laboratory, which involves an increasing demand for nanopositioning and nanomeasuring machines as well as for miniature tactile probes for measuring complex three-dimensional objects. The challenge is that these components—for example, diesel injectors, microgears and small optics—feature dimensions in the micrometre range with associated dimensional tolerances below 100 nm. For this reason, a significant number of research projects have dealt with microprobes for performing the dimensional measurements of microstructures with the goal of achieving measurement uncertainties in the nanometre range. This paper introduces an updated version of a 3D microprobe with an optical detection system developed at the Institute of Process Measurement and Sensor Technology. It consists of a measuring head and a separate probe system. The mechanical design of the probe system has been completely overhauled to enable the exchange of the stylus separately from the flexure elements. This is very important for the determination of the probing sphere's roundness deviations. The silicon membranes used in the first system design are therefore replaced by metal membranes. A new design of these membranes, optimized for isotropic probing forces and locking parasitic movements, is presented. Regarding the measuring head, the optical design has been redesigned to eliminate disruptive interference on the quadrant photodiode used for deflection measurement and to improve adjustment. Its dimensioning is discussed, especially the influence of the laser beam diameter on the interference contrast due to the parallel misalignment of the collimated laser beam. Initial measurement results are presented to prove functionality.

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The interferometric length measurement value in multi-axis positioning and measuring systems is directly influenced by the topography of reference mirrors. Form deviations of the mirror plane can cause systematic measurement errors because the specimen geometry is superimposed upon the topography of reference mirrors. This article discusses the complete acquisition of the topography of a special mirror arrangement with the help of a Fizeau interferometer to correct systematic measurement errors after the raw measurement using the expanded three-flat test. Furthermore, other influencing factors are presented in the article, e.g., measurement errors caused by the Fizeau interferometer. Additionally, temporal changes of the reference mirror topography are detected by regularly occurring measurements, and the topography data used as the correction reference are updated accordingly.