Topological insulators
(TIs) have become popular in the field of optoelectronic devices because
of their broadband and high-sensitivity properties, which are attributed
to the narrow band gap of the bulk state and high mobility of the
Dirac surface state. Although perfectly grown TIs are known to exhibit
strong stability against oxidation, in most cases, the existence of
vacancy defects in TIs reacts to air and the characteristics of TIs
is affected by oxidation. Therefore, changes in the band structure
and electrical characteristics by oxidation should be considered.
A significant change occurs because of the oxidation; however, the
dependence of the photoresponse of TIs on oxidation has not been studied
in detail. In this study, the photoresponsivity of oxidized Bi2Se3 films is enhanced, rather than degraded, after
oxidation in air for 24 h, resulting in a maximum responsivity of
140 mA W–1. This responsivity is substantially higher
than previously reported values for Bi2Se3.
Furthermore, a change in the photoresponse time of Bi2Se3 due to air exposure is systematically observed. Based on
variations in the Fermi level and work function, using photoelectron
spectroscopy, it is confirmed that the responsivity is improved from
the junction effect of the Bi-based surface oxidized layer.