The Effects of Deposition Time and Seed Layer on Morphological Properties of Zinc Oxide by Chemical Bath Deposition

Abstract

In this work, chemical bath deposition (CBD) method is used to form zinc oxide (ZnO) thin film nanostructures. Three types of zinc (Zn) precursors, namely Zn (NO3)2, ZnSO4 and ZnCl2, were used and the deposition time in water bath were controlled for 20, 40 and 60 minutes at 85 °C respectively. The effect of seed layer, by using potassium permanganate (KMnO4) solution, on the formation of zinc oxide (ZnO) thin films on glass substrates has been determined. It was found that the presence of the seed layer promote better adhesion of the films which allows ZnO to form with a higher growth rate on the substrate with only little or no loss by precipitation in the solution. The enhancement of the thin film adhesion is due to the in situ nucleation centres formation of hydrated oxide colloids of Mn (O)OH, acting as metal ion binding centres on the glass substrates surface. Meanwhile, in the absence of a seed layer, only scattered ZnO deposits are formed on substrates. By varying the deposition time, ZnO nanostructures with different length and diameter can be formed.

Influence of Applied Potential on Electrodeposited ZnSe/ZnO Nanostructured Films for Photoelectrochemical Cell

“…For instance, the most frequently used method to deposit ZnSe recent years is chemical bath deposition, due to its inexpensive, reproducibility and simplicity [1]. However chemical bath deposition has some drawbacks, such as inefficient utilization of reactants that will generate significant amount of waste from solvent throughout the deposition process [2], the drawback amplifies if toxic reactants were used instead of environmental friendly materials, ultimately harming the environment. Besides that, another disadvantage of using chemical bath deposition method is low material yield.…”