2021
DOI: 10.1016/j.measen.2021.100257
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The FDTD analysis for dark field in-process depth measurements of fine microgrooves

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Cited by 3 publications
(2 citation statements)
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“…Edited by Nai Mui Ling Sharon and A. Senthil Kumar has a cutoff condition that light can hardly go into the microgroove when the width is smaller than half of the wavelength. The theoretical cutoff condition is given by the following equation [6]. Therefore, the TE phase-depth relation has almost no dependency when the pitch size is smaller than the wavelength of 633 .…”
Section: Table 1 Parameters For Numerical Simulationmentioning
confidence: 99%
See 1 more Smart Citation
“…Edited by Nai Mui Ling Sharon and A. Senthil Kumar has a cutoff condition that light can hardly go into the microgroove when the width is smaller than half of the wavelength. The theoretical cutoff condition is given by the following equation [6]. Therefore, the TE phase-depth relation has almost no dependency when the pitch size is smaller than the wavelength of 633 .…”
Section: Table 1 Parameters For Numerical Simulationmentioning
confidence: 99%
“…The previously mentioned problem of phase blur can be solved by dark-field observation: the reflection from the top surface of the microgroove is not collected by microscopy under oblique illumination, while the bottom reflection can propagate perpendicularly and be collected by microscopy. Therefore, a dark-field depth measurement method has been proposed that the phase of TM can measure the depth of the microgroove by taking the TE phase as a reference [6].…”
Section: Introductionmentioning
confidence: 99%