A closed‐tube chemical‐transport technique to grow epitaxial layers of cadmium telluride on the basal planes of cadmium sulphide is described. In this technique the transport agent of the reaction is hydrochloric acid obtained by thermal dissociation of solid NH4Cl. It is shown that the introduction of extra hydrogen in the closed system allows a lowering of the substrate temperature at which epitaxial deposition may occur. The particular geometry of the closed tube is discussed in view of the obtainement of a diffusion‐limited transport mechanism.