The experimental details are given of an eviporation technique for producing epitaxial layers of zinc selenide on 0.1 Rcm p-type germanium substrates. The degree of crystal order in the deposited layer is presented and the results show that, whilst the (100) orientation readily produces epitaxial layers of zinc selenide, the (110) and (111) orientations are more restricted. The preliminary electrical characteristics of the devices formed on the (100) substrate indicate that, at the higher grou t h temperatures, an interfare layer is formed between the germanium and zinc selenide.On prirsente les details expkrimentaux d'une technique d'6vaporation pour la production des couches de ZnSe sur des substrats de Ge de type p et de 0,l ncm. Le degri: d'orientation cristalline dans la couche d6posee est present&. Les resultats indiquent que les plans d'orientation (100) produisent facilement des couches itpitaxikes de ZnSe, tandis qu'il n'en est pas ainsi pour les orientations (1 10) et (1 11). Le caractere dectrique preliminaire des diodes formees stir 1e plan (100) des substrats indique que, aux temperatures plus &levees de d6po-sition. une couche d'interface est formee entri: le Ge et le ZnSe.
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