The influence of atomic layer deposition process temperature on ZnO thin film structure

Boryło, Paulina; Matus, Krzysztof; Lukaszkowicz, K.; Kubacki, Jerzy; Balin, Katarzyna; Basiaga, Marcin; Szindler, M.; Mikuła, J.

doi:10.1016/j.apsusc.2018.03.169

Cited by 30 publications

(36 citation statements)

References 17 publications

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“…As displayed in Figure 3b, two peaks located at 1021.1 and 1044.1 eV can be obviously seen, which can be attributed to the Zn 2p 3/2 and Zn 2p 1/2 electronic states, respectively. The interval between the Zn 2p 3/2 and Zn 2p 1/2 electronic states was calculated to be 23.0 eV, which was generated from the spin-orbit splitting and is the same as the previously reported value [32]. In addition, the binding energy of the Zn 2p 3/2 electronic states was slightly lower than the reported value (1021.8 eV) of the bulk ZnO [33].…”

Section: Resultssupporting

confidence: 70%

“…In addition, the binding energy of the Zn 2p3/2 electronic states was slightly lower than the reported value (1021.8 eV) of the bulk ZnO [33]. XPS O 1s core-level spectra XPS has been demonstrated to be a powerful technology for confirming the chemical composition and electronic structure of the as-received ZnO thin films [32], as depicted in Figure 3a-d. Figure 3a represents the XPS analysis spectra of the as-achieved ZnO thin films grown on quartz glass and sapphire (001) substrates annealed at 600 • C for 1 h, respectively. Several peaks can be seen in Figure 3a, which correspond to the elements of Zn, C, and O, respectively.…”

Section: Resultsmentioning

confidence: 84%

“…From what is mentioned above, it can be concluded that the as-received ZnO thin films grown on the quartz glass substrate was comparable to that on sapphire (001) substrate in terms of its morphological properties. XPS has been demonstrated to be a powerful technology for confirming the chemical composition and electronic structure of the as-received ZnO thin films [32], as depicted in Figure 3ad. Figure 3a represents the XPS analysis spectra of the as-achieved ZnO thin films grown on quartz glass and sapphire (001) substrates annealed at 600 °C for 1 h, respectively.…”

Section: Resultsmentioning

confidence: 99%

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Comparative Study of ZnO Thin Films Grown on Quartz Glass and Sapphire (001) Substrates by Means of Magnetron Sputtering and High-Temperature Annealing

et al. 2019

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In this work, we reported a comparative study of ZnO thin films grown on quartz glass and sapphire (001) substrates through magnetron sputtering and high-temperature annealing. Firstly, the ZnO thin films were deposited on the quartz glass and sapphire (001) substrates in the same conditions by magnetron sputtering. Afterwards, the sputtered ZnO thin films underwent an annealing process at 600 °C for 1 h in an air atmosphere to improve the quality of the films. X-ray diffraction, scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy (XPS), ultraviolet-visible spectra, photoluminescence spectra, and Raman spectra were used to investigate the structural, morphological, electrical, and optical properties of the both as-received ZnO thin films. The ZnO thin films grown on the quartz glass substrates possess a full width of half maximum value of 0.271° for the (002) plane, a surface root mean square value of 0.50 nm and O vacancies/defects of 4.40% in the total XPS O 1s peak. The comparative investigation reveals that the whole properties of the ZnO thin films grown on the quartz glass substrates are comparable to those grown on the sapphire (001) substrates. Consequently, ZnO thin films with high quality grown on the quartz glass substrates can be achieved by means of magnetron sputtering and high-temperature annealing at 600 °C.

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Section: Resultssupporting

confidence: 70%

Section: Resultsmentioning

confidence: 84%

Section: Resultsmentioning

confidence: 99%

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Comparative Study of ZnO Thin Films Grown on Quartz Glass and Sapphire (001) Substrates by Means of Magnetron Sputtering and High-Temperature Annealing

et al. 2019

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“…Ultimately, as a result of the sequential surface reaction, an ultra-thin layer is formed. The advantages of the ALD method include, among others: an accurate control of the thickness of the deposited layers, good reproducibility, high homogeneity over a large area, excellent compatibility, denseness and compactness without discontinuities or defects in the structure, and low growth temperatures (in the case of this layer, the temperature window is in the range of 100–200 °C) [ 2 , 26 , 27 , 28 ].…”

Section: Introductionmentioning

confidence: 99%

“…In the case of the ZnO layer, the ALD temperature window has been investigated by many authors, and there exists no doubt regarding this matter [ 2 , 4 , 7 , 8 , 9 , 18 , 19 , 20 , 21 , 35 , 36 , 37 ]. Unfortunately, there is little research work related to determining the optimal number of ALD cycles for this layer applied to a steel substrate, which would ensure the best performance properties, in particular corrosion resistance.…”

Section: Introductionmentioning

confidence: 99%

Structure and Properties of ZnO Coatings Obtained by Atomic Layer Deposition (ALD) Method on a Cr-Ni-Mo Steel Substrate Type

et al. 2020

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This paper aimed to investigate the structure and physicochemical and tribological properties of ZnO coatings deposited by ALD on 316L stainless steel for biomedical applications. To obtain ZnO films, diethylzinc (DEZ) and water were used as ALD precursors. Zinc oxide layers were deposited at the same temperature of 200 °C using three types of ALD cycles: 500, 1000 and 1500. The structure and morphology of ZnO coatings were examined using SEM and AFM microscopes. The XRD and GIXRD methods were used for the phase analysis of the obtained coatings. To determine the resistance to pitting corrosion, potentiodynamic investigations and impedance spectroscopy were conducted in a Ringer solution at a temperature of 37 °C. The obtained results showed that the number of ALD cycles had a significant impact on the structure, morphology and corrosion resistance of the ZnO layers. It was found that after increasing the coating thickness of the ZnO on the material, its electrochemical properties determining the corrosion resistance also increased. Moreover, on the basis of the ball-on-plate tribological investigations, we found a significant reduction in the friction coefficient of the samples with the investigated coatings in relation to the noncoated substrates.

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The influence of the parameters of the zinc oxide layer deposition process using the atomic layer deposition method on the physical and mechanical properties of 316LVM steel

Basiaga

Walke

Sambok-Kiełbowicz

et al. 2020

Materialwissenschaft Werkst

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The analysis of most of the work on the use of surgical implants shows that the physical, chemical and mechanical properties of the implant surface determine the effectiveness of their use. Therefore, in the currently conducted research, the greatest attention is focused on the development of coating conditions on the surface of implants, limiting, among others, biofilm formation. In addition to the improvement of electrochemical properties, an important issue related to the production of layers is also an appropriate set of physical and mechanical properties. Therefore, the paper attempts to assess the physical and mechanical properties of the applied zinc oxide layers on the LVM 316 steel substrate using the atomic layer deposition (ALD) method. As part of the assessment of mechanical properties of the resulting surface layers, the tests of adhesion to the metal substrate (scratch test) were carried out. In turn, as part of the physical properties assessment, surface roughness tests (atomic force microscopy – AFM) and its wettability were carried out. Such a comprehensive approach will allow the development of an antibacterial layer with optimal physical and mechanical properties for applications with metal implants.

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The influence of atomic layer deposition process temperature on ZnO thin film structure

Cited by 30 publications

References 17 publications

Comparative Study of ZnO Thin Films Grown on Quartz Glass and Sapphire (001) Substrates by Means of Magnetron Sputtering and High-Temperature Annealing

Comparative Study of ZnO Thin Films Grown on Quartz Glass and Sapphire (001) Substrates by Means of Magnetron Sputtering and High-Temperature Annealing

Structure and Properties of ZnO Coatings Obtained by Atomic Layer Deposition (ALD) Method on a Cr-Ni-Mo Steel Substrate Type

The influence of the parameters of the zinc oxide layer deposition process using the atomic layer deposition method on the physical and mechanical properties of 316LVM steel

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