2008
DOI: 10.1016/j.apsusc.2007.11.011
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The influence of Fermi energy on structural and electrical properties of laser crystallized P-doped amorphous silicon

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Cited by 3 publications
(2 citation statements)
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“…The p-type layer of a-SiC: H is applied to the solar cell on top lapiasan, the p-type layer in solar cells based on a-SiC: H p-i-n. As a light-receiving layer, p-type layer should be transparent so that the incoming photons more much, which means the carrier concentration increases [1][2][3]. In order for the p-type layer to be transparent and able to increase the concentration of the charge carrier, carbon is added when depositing the p-type layer which is made thinner.…”
Section: Introductionmentioning
confidence: 99%
“…The p-type layer of a-SiC: H is applied to the solar cell on top lapiasan, the p-type layer in solar cells based on a-SiC: H p-i-n. As a light-receiving layer, p-type layer should be transparent so that the incoming photons more much, which means the carrier concentration increases [1][2][3]. In order for the p-type layer to be transparent and able to increase the concentration of the charge carrier, carbon is added when depositing the p-type layer which is made thinner.…”
Section: Introductionmentioning
confidence: 99%
“…In this paper we use amorphous Si instead of phosphor nitride as a dopant source, since it does nominally not contain any atoms other than P, Si, and H. The latter may support the ablation process since the film decomposes in H gas and Si 6 and might help to passivate defects if some H is transferred into the wafer. Carbon or nitrogen‐related defects are avoided.…”
Section: Introductionmentioning
confidence: 99%