We present and generalize the preparation conditions and properties of heavily doped and strongly compensated (HDSC) Ge films obtained by deposition in the vacuum onto the semi-insulating GaAs (100) substrates. A possibility of formation of Ge films with various doping levels and compensation degrees (in particular, fully compensated) is demonstrated. Heavily doped and fully compensated Ge single-crystalline thin (∼0.1 μm) films obtained have high resistivity (up to 140 Ω cm), conductance activation energy as high as half the bandgap of Ge, low free charge carrier mobility (∼50 cm2/V s), and concentration (∼1014–1015 cm−3). The electrical and optical properties of the films are explained with allowance made for the presence of large-scale fluctuations of electrostatic potential in Ge. Under certain conditions, a two-dimensional potential relief may exist in thin HDSC Ge films, as well as two-dimensional percolation may occur.