Temperature-programmed reaction spectroscopy has been used to study the surface reaction between CO and O-atoms on Rh͑100͒ and Rh͑111͒ at a range of different adsorbate coverages. Comparison of the reaction on both surfaces in the low coverage regime, where the kinetics can be described by a straightforward Langmuir-Hinshelwood mechanism reveals that the CO oxidation is structure sensitive, with the rate constant being an order of magnitude higher on the Rh͑100͒ than on the Rh͑111͒ surface. As a consequence, the selectivity of the COϩO reaction to CO 2 is about 100% on Rh͑100͒, whereas on Rh͑111͒ the oxidation reaction competes with CO desorption. At low CO coverage, CO oxidation is an elementary step on Rh͑100͒ for a broad range of oxygen coverages. We report kinetic parameters E a ϭ103Ϯ5 kJ/mol and ϭ10 12.7Ϯ0.7 for O ϭ CO →0 on Rh͑100͒. The activation energy for CO oxidation on Rh͑100͒ decreases continuously with increasing O-coverage. At low coverage ( O Ͻ0.25 ML͒ we attribute this to destabilization of CO, leading to an increase in the CO 2 formation rate. At higher coverage ( O Ͼ0.25 ML͒ O-atoms become destabilized as well, as lateral interactions between O-atoms come into play at these coverages. The interactions result in a greatly enhanced rate of reaction at higher coverages.