1979
DOI: 10.1016/0376-4583(79)90057-8
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The relationship between polarisation characteristics and the electropolishing behaviour of copper

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Cited by 6 publications
(2 citation statements)
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“…9. IPF of AG conventional sample, xy potential, the second region, the plateau region, where current increases slowly with increase in potential, followed by the third region at higher potentials where there is a rapid increase in the current (Ref 72,73).…”
Section: Electropolishingmentioning
confidence: 99%
“…9. IPF of AG conventional sample, xy potential, the second region, the plateau region, where current increases slowly with increase in potential, followed by the third region at higher potentials where there is a rapid increase in the current (Ref 72,73).…”
Section: Electropolishingmentioning
confidence: 99%
“…The relationship between the polarization behavior and the surface defects examined with optical microscopy has been studied. 8 Using X-ray photoelectron spectroscopy and Auger electron spectroscopy a viscous liquid film was observed, however, no solid film was found. 9 In addition, the number of in situ surface characterization studies remains limited.…”
mentioning
confidence: 99%