2021
DOI: 10.1063/5.0056524
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The role of etching anisotropy in the fabrication of freestanding oxide microstructures on SrTiO3(100), SrTiO3(110), and SrTiO3(111) substrates

Abstract: The release process for the fabrication of freestanding oxide microstructures relies on appropriate, controllable, and repeatable wet etching procedures. SrTiO3 (STO) is among the most employed substrates for oxide thin films growth and can be decomposed in HF:water solution. Such a process is strongly anisotropic and is affected by local defects and substrate cut-planes. We analyze the etching behavior of SrTiO3 substrates having (100), (110), and (111) cut-planes during immersion in a 5% HF:water solution. T… Show more

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Cited by 5 publications
(2 citation statements)
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“…The etching process is different for the two cut‐planes, determining a different geometry of the clamping points and substrate morphology. [ 39 ] This is visible in Figure , where we show 250 µm long LSMO bridges fabricated on top of STO(100) (top) and STO(110) (bottom). The etched STO(100) shows pyramids on its surface, while the STO(110) is rather flat.…”
Section: Resultsmentioning
confidence: 92%
“…The etching process is different for the two cut‐planes, determining a different geometry of the clamping points and substrate morphology. [ 39 ] This is visible in Figure , where we show 250 µm long LSMO bridges fabricated on top of STO(100) (top) and STO(110) (bottom). The etched STO(100) shows pyramids on its surface, while the STO(110) is rather flat.…”
Section: Resultsmentioning
confidence: 92%
“…[1][2][3] In fact, this same principle applies to SrTiO 3 crystal particles. [4][5][6][7][8] Recently, the advantages of the exposure of multi-crystal facets of the SrTiO 3 crystal have become more and more important. T. Takata et al 9 developed a modified aluminum-doped SrTiO 3 photocatalyst with a regular polyhedral morphology and exposed the (100) and (110) facets, which displayed a high performance in overall water splitting with an external quantum efficiency of up to 96%.…”
Section: Introductionmentioning
confidence: 99%