This paper examines social-psychological factors that can facilitate and hinder public support for conservative agendas over time. Using four waves of longitudinal panel data from Chile (N = 2,394), we estimated the between-person and within-person associations among individuals' self-reported conservative ideologies, political disaffection, civic behaviour, political attitudes towards democracy and social change, and their support for conservative (vs progressive) social movements over time. As expected, between-person increases in social dominance orientation (SDO), rightwing authoritarianism (RWA), right-wing self-categorization, and political disaffection correlated positively with support for conservative social movements. Betweenperson increases in people's social change beliefs, support for democracy, and civic participation predicted less support for conservative social movements over time. Within-person increases in RWA and SDO correlated positively with conservative social movement support, whereas civic participation correlated negatively with it.Results provide novel evidence for the dynamic processes underlying support for conservative/progressive agendas.

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The release process for the fabrication of freestanding oxide microstructures relies on appropriate, controllable, and repeatable wet etching procedures. SrTiO3 (STO) is among the most employed substrates for oxide thin films growth and can be decomposed in HF:water solution. Such a process is strongly anisotropic and is affected by local defects and substrate cut-planes. We analyze the etching behavior of SrTiO3 substrates having (100), (110), and (111) cut-planes during immersion in a 5% HF:water solution. The etching process over the three substrates is compared in terms of pitting, anisotropy, macroscopic etch rate, and underetching effects around HF-resistant (La,Sr)MnO3 thin film micropatterns. The release of targeted structures, such as the reported (La,Sr)MnO3 freestanding microbridges, depends on the substrate crystallographic symmetry and on the in-plane orientation of the structures themselves along the planar directions. By comparing the etching evolution at two different length scales, we distinguish two regimes for the propagation of the etching front: an intrinsic one, owing to a specific lattice direction, and a macroscopic one, resulting from the mixing of different etching fronts. We report the morphologies of the etched SrTiO3 surfaces and the geometries of the underetched regions as well as of the microbridge clamping zones. The reported analysis will enable the design of complex MEMS devices by allowing to model the evolution of the etching process required for the release of arbitrary structures made of oxide thin films deposited on top of STO.

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We report on the formation of gas bubbles during the release of MEMS devices using buffered oxide etch. Several approaches to mitigate the problem are proposed and tested together with a qualitative study of the phenomenon. The chemical reaction behind such phenomenon and the influence of defects and topography is discussed. Finally, a comparison with the HF-vapor release technique is shown.