2002
DOI: 10.1063/1.1458057
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Thermal conduction in doped single-crystal silicon films

Abstract: This work measures the thermal conductivities along free-standing silicon layers doped with boron and phosphorus at concentrations ranging from 1ϫ10 17 to 3ϫ10 19 cm Ϫ3 at temperatures between 15 and 300 K. The impurity concentrations are measured using secondary ion mass spectroscopy ͑SIMS͒ and the thermal conductivity data are interpreted using phonon transport theory accounting for scattering on impurities, free electrons, and the layer boundaries. Phonon-boundary scattering in the 3-m-thick layers reduces … Show more

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Cited by 417 publications
(258 citation statements)
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“…Comparisons between measurements of Si, Si:B and Si 0.99 Ge 0.01 allows us to study how Fourier theory failure in TDTR experiments relate to differences in MFP distributions because hole/phonon and point-defect/phonon scattering produce controlled differences in the MFP distributions of these materials 21 . We quantify the impact of hole/phonon and point-defect/phonon scattering on the L of Si with thermal conductivity relaxation time approximation (RTA) models for Si, Si:B and Si 0.99 Ge 0.01 (see Supplementary Methods).…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Comparisons between measurements of Si, Si:B and Si 0.99 Ge 0.01 allows us to study how Fourier theory failure in TDTR experiments relate to differences in MFP distributions because hole/phonon and point-defect/phonon scattering produce controlled differences in the MFP distributions of these materials 21 . We quantify the impact of hole/phonon and point-defect/phonon scattering on the L of Si with thermal conductivity relaxation time approximation (RTA) models for Si, Si:B and Si 0.99 Ge 0.01 (see Supplementary Methods).…”
Section: Resultsmentioning
confidence: 99%
“…In our second set of experiments, we perform TDTR measurements of Si, Si 0.99 Ge 0.01 and Si heavily doped with boron (Si:B) as a function of w 0 , f and temperature. The Ge in Si 0.99 Ge 0.01 preferentially scatters high-frequency phonons due to mass disorder 20 , while the boron in Si:B preferentially scatters low-frequency phonons due to hole/phonon scattering 21 . As a result, the MFP distributions are systematically different in Si, Si 0.99 Ge 0.01 and Si:B, allowing us to relate differences in the phonon dynamics to differences in how Fourier theory fails.…”
Section: )?mentioning
confidence: 99%
“…As the electric current is applied to the bilayer, a temperature gradient sets in due to differential Joule heating of both the layers (the electrical conductivity of the Ni 80 Fe 20 thin film layer is significantly larger than that of the p-Si layer). Thermal conductivity differences should also contribute to the thermal gradient; Ni 80 Fe 20 has a thermal conductivity of 23 W/mK (approximately for ~50 nm thick [15]), which is significantly lower than that of Si ( ~80 W/mK [16]). This temperature gradient (see We propose that spin-Hall effect (SHE) in p-Si could be the other mechanism responsible for spin polarization.…”
Section: (Figure 1)mentioning
confidence: 99%
“…The maximum temperature reaches 300.64 K and progressively decreases to 300 K toward the back of the substrate, where a heat sink is attached. It is worth noting that this level of temperature change does not significantly affect the carrier concentration 23 and, hence, the resonance and absorption conditions. Since the pillar is surrounded by air with very low thermal conductivity, the heat can barely escape to the side and to adjacent unit cells, even in the case of a nonuniform excitation.…”
mentioning
confidence: 99%
“…The thermal conductivity of the phosphorus-doped silicon is 149 W/K/m, compared with 0.026 W/K/m for air. 23 Since the cavity array is uniform, symmetric, and excited at normal incidence, there is no heat flow across unit cells and between the two halves of a unit cell. Hence, an adiabatic boundary condition is applied to all transverse boundaries and onto the two symmetry planes.…”
mentioning
confidence: 99%