“…Among the materials to narrow the band gap of ZnO, the ternary semiconductor Cd x Zn 1−x O, alloying ZnO with CdO, is most promising [4,5]. The main reasons are as follows: (1) Cd and Zn ions have similar ionic radii of ∼0.74 and 0.60Å, respectively; (2) CdO has a direct band gap of ∼2.3 eV at room temperature, ∼1.0 eV narrower than that of ZnO [6,7]. In recent years, a variety of methods have been employed to deposit Cd x Zn 1−x O films, such as pulsed laser deposition [4,8], molecular beam epitaxy [9][10][11], metalorganic vapor-phase epitaxy [12,13], and magnetron sputtering [14].…”