2017
DOI: 10.1111/jace.14927
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Thickness‐dependent domain wall reorientation in 70/30 lead magnesium niobate‐ lead titanate thin films

Abstract: Continued reduction in length scales associated with many ferroelectric film‐based technologies is contingent on retaining the functional properties as the film thickness is reduced. Epitaxial and polycrystalline lead magnesium niobate‐lead titanate (70PMN‐30PT) thin films were studied over the thickness range of 100‐350 nm for the relative contributions to property thickness dependence from interfacial and grain‐boundary low permittivity layers. Epitaxial PMN‐PT films were grown on SrRuO3/(001)SrTiO3, while p… Show more

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Cited by 15 publications
(9 citation statements)
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References 75 publications
(153 reference statements)
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“…The dielectric constant increases with film thickness. Such behavior was reported previously and attributed to the change of the relative thickness fraction of a dead-layer (at the film/electrode layer) , and/or the enhancement of 180°-domain wall motion (extrinsic contribution) with increasing film thickness. , …”
Section: Resultssupporting
confidence: 78%
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“…The dielectric constant increases with film thickness. Such behavior was reported previously and attributed to the change of the relative thickness fraction of a dead-layer (at the film/electrode layer) , and/or the enhancement of 180°-domain wall motion (extrinsic contribution) with increasing film thickness. , …”
Section: Resultssupporting
confidence: 78%
“…Such behavior was reported previously and attributed to the change of the thickness fraction of a dead-layer (at the film/electrode layer) 19,20 and/ or the enhancement of 180°-domain wall motion (extrinsic contribution) with increasing film thickness. 21,22 In order to determine the electric breakdown field, the P−E loops were measured from a low maximum electric field (such as 200 kV cm −1 ) up to the electric field where the capacitors failed. Parts a and b of Figure 5 show the P−E loops of typical 1000 nm-thick PLZT thin films grown on CNOns/Si and TiOns/Si substrates, measured up to their E BD values.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…It was found that 2.5% Pr-PMN-PT thin films were mostly in the perovskite phase with a little pyrochlore phase when annealed for 1 min, which was further crystallized to a single perovskite phase structure after one more minute annealing. However, a peak of the pyrochlore phase was found again in the sample annealed for 5 min, which can be ascribed to the greater lead loss caused by the longer time annealing [19].…”
Section: Resultsmentioning
confidence: 99%
“…The values of ε r , p y , and p r in 2.5% Pr-PMN-PT thin films were on the order of 2400, 167 μC/m 2 K, and 17.3 μC/cm 2 , showing 110%, 123%, and 50% higher factors respectively than those in pure PMN-PT thin films. Compared with PMN-0.30PT grown by a chemical solution deposition (CSD) method [19], the ε r in PMN-0.30PT thin films on Si substrate was lower than that of the sample synthesized on perovskite structure single crystal substrates. A similar tendency of pyroelectric property was found in PMN-0.30PT thin film grown on various substrates.…”
Section: Resultsmentioning
confidence: 99%
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