2014
DOI: 10.1504/ijnbm.2014.069824
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Thickness dependent microstructure of ZnO films prepared by spin coating technique

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“…Recently, many scientists and researchers have been extensively studied and worked on the wide energy gap semiconductor materials includes ZnO due to their excellent properties and uses in optoelectronic (OPE) devices [2]. The ZnO has a hexagonal wurtzite structure and direct optical energy gap which is 3.37 eV at room temperature (RT) [3][4][5][6]. At RT, the ZnO has the wider and larger exciton binding energy which is 60 meV compared to the Gallium Nitrate (GaN) which is (20 meV) [4,7].…”
Section: Introductionmentioning
confidence: 99%
“…Recently, many scientists and researchers have been extensively studied and worked on the wide energy gap semiconductor materials includes ZnO due to their excellent properties and uses in optoelectronic (OPE) devices [2]. The ZnO has a hexagonal wurtzite structure and direct optical energy gap which is 3.37 eV at room temperature (RT) [3][4][5][6]. At RT, the ZnO has the wider and larger exciton binding energy which is 60 meV compared to the Gallium Nitrate (GaN) which is (20 meV) [4,7].…”
Section: Introductionmentioning
confidence: 99%