Thin film atomic layer deposition equipment for semiconductor processing

Sneh, Ofer; Clark-Phelps, R.; Londergan, A.; Winkler, Jereld; Seidel, Thomas E.

doi:10.1016/s0040-6090(01)01678-9

Cited by 272 publications

(159 citation statements)

References 31 publications

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“…HfO 2 -Al 2 O 3 [1], ZrO 2 -Al 2 O 3 [2][3][4][5][6], ZrO 2 -Y 2 O 3 [7], ZrO 2 -SiO 2 [7], HfO 2 -Al 2 O 3 [8,9], TiO 2 - [18,20], ZrO 2 -Er 2 O 3 [21], ZrO 2 -Gd 2 O 3 [22], and TiO 2 -Cr 2 O 3 [23].…”

Section: Introductionmentioning

confidence: 99%

“…Such oxide-based nanolaminates have been studied as materials able to provide good compromise between leakage current density and dielectric permittivity, enhancing charge storage capability of capacitor dielectrics while aiming at the improvement of the performance of, e.g., electroluminescent devices [10,14], field effect transistors [2,7,13,18,20], and memories [5,9,16,21,22]. Especially important industrially are the ZrO 2 -Al 2 O 3 -ZrO 2 structures [24] used in dynamic random access memory cells.…”

Section: Introductionmentioning

confidence: 99%

“…Nanolaminates of single oxides may be grown using different physical and chemical techniques, such as electron beam evaporation [13], sputtering [4], pulsed laser deposition [6] or, as apparently the most controlled method, atomic layer deposition (ALD) [1][2][3]5,7,[9][10][11][12][14][15][16][17][18][22][23][24]26]. Studies on ALD-grown nanolaminates containing rare earth oxides have so far been quite scarce [21,22], though, and none has been grown using Ti and Ho oxides as constituents.…”

Section: Introductionmentioning

confidence: 99%

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Holmium and titanium oxide nanolaminates by atomic layer deposition

Kukli

Link

et al. 2014

Thin Solid Films

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(001) substrates by atomic layer deposition at 300 °C from alkoxide and -diketonate based metal precursors and ozone. Individual layer thicknesses were 2 nm for TiO 2 and 4.5 nm for Ho 2 O 3 .As-deposited films were smooth and X-ray amorphous. After annealing at 800 °C and higher temperatures the nanolaminate structure was destroyed by solid-state reaction to form Ho 2 Ti 2 O 7 . The films demonstrated diamagnetic or paramagnetic behaviour in the as-deposited state. After annealing, the films possessed net magnetic moment, allowing one to record saturation magnetization and weak coercivity.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Holmium and titanium oxide nanolaminates by atomic layer deposition

Kukli

Link

et al. 2014

Thin Solid Films

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“…ALD is essentially a modified chemical vapor deposition (CVD) process where the reaction pathway is separated into two separate half-reactions. In general, ALD deposition is described a sequence of discrete, self-limiting, surface reactions where the absorption of the reactive species to the surface is the dominate process step (Sneh et al 2002).…”

Section: Mesh Generationmentioning

confidence: 99%

LDRD Project 52523 final report :Atomic layer deposition of highly conformal tribological coatings.

Jungk

Dugger²,

George

et al. 2005

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Friction and wear are major concerns in the performance and reliability of micromechanical (MEMS) devices. While a variety of lubricant and wear resistant coatings are known which we might consider for application to MEMS devices, the severe geometric constraints of many micromechanical systems (high aspect ratios, shadowed surfaces) make most deposition methods for friction and wear-resistance coatings impossible. In this program we have produced and evaluate highly conformal, tribological coatings, deposited by atomic layer deposition (ALD), for use on surface micromachined (SMM) and LIGA structures. ALD is a chemical vapor deposition process using sequential exposure of reagents and selflimiting surface chemistry, saturating at a maximum of one monolayer per exposure cycle. The self-limiting chemistry results in conformal coating of high aspect ratio structures, with monolayer precision. ALD of a wide variety of materials is possible, but there have been no studies of structural, mechanical, and tribological properties of these films. We have developed processes for depositing thin (

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“…The self-limiting nature of the chemistries implemented in ALD process produce high quality, dense and nearly pinhole-free films with thickness control at the atomic level, excellent thickness uniformity and unequalled conformality. ALD has been demonstrated to produce films that are nearly perfectly conformal even for nanoporous substrates whose pore depth to diameter ratio far exceeds ten to one [22][23][24].…”

Section: Introductionmentioning

confidence: 99%

Protecting silver cultural heritage objects with atomic layer deposited corrosion barriers

et al. 2015

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Introduction: Silver, prized throughout history for its luster and shine, develops a black Ag 2 S tarnish layer that is aesthetically displeasing when exposed to atmospheric pollutants. Tarnishing, and subsequent polishing, leads to irreversible material loss and object damage. Currently, nitrocellulose coatings are often used to prevent silver from tarnishing, however non-uniform coatings and degradation over time limit their effectiveness. Atomic layer deposition (ALD) has been explored as a new method for creating dense, uniform, and conformal coatings on 3-dimensional (3D) objects that are more effective than nitrocellulose in preventing silver from tarnishing. Results:To create high quality ALD coatings on 3D objects, slowing down the ALD process is critical to ensure proper precursor exposure. Non-ideal deposition of organo-oxy-metallic compounds can occur with fast deposition rates that do not allow sufficient flow around 3D objects. The coatings can be removed by dissolving the Al 2 O 3 ALD films in aqueous NaOH. Thicker ALD films prevent defects from occurring on non-ideal surfaces and effectively prevent silver objects from tarnishing under ambient aging conditions. Conclusion:Thick ALD films, deposited with sufficiently long precursor pulse and purge times, may be effective in preventing complex, 3D non-mixed media silver cultural heritage objects from tarnishing.

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Thin film atomic layer deposition equipment for semiconductor processing

Cited by 272 publications

References 31 publications

Holmium and titanium oxide nanolaminates by atomic layer deposition

Holmium and titanium oxide nanolaminates by atomic layer deposition

LDRD Project 52523 final report :Atomic layer deposition of highly conformal tribological coatings.

Protecting silver cultural heritage objects with atomic layer deposited corrosion barriers

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