“…For the production of Ga 2 O 3 films, various synthetic methods such as oxidation of Ga-containing surfaces [11][12][13], evaporation [14], sol-gel process [15], sputtering [16][17][18], pulsed laser deposition [19], molecular beam epitaxy [20], and chemical vapor deposition (CVD) have been studied. In order to use the metal organic CVD method, which has an advantage of more flexibility, good step coverage, producing uniform, pure, reproducible, and adherent films, the precursors of Ga(hfac) 3 [22] have been developed.…”