Thin film interreaction of Al/Ag analyzed by tomographic atom probe

Evaporation mechanisms of MgO in laser assisted atom probe tomography

“…The schematic and instrumental details of the sputter deposition are described elsewhere [5]. It is very important to clean the substrate by ion beam prior to deposition to achieve good mechanical stability of the specimen [15]. The base pressure of the deposition chamber before deposition is 10 À 5 Pa. Ar pressure during the sputtering is 2 Â 10 À 2 Pa.…”

Investigation of oxide tunnel barriers by atom probe tomography (TAP)

“…For the analysis, tips were introduced into the tomographic atom probe at Go¨ttingen university, which was build around a detector system [14]. Switching between tip cleaning and coating is achieved by a simple rotation of the specimen stage.…”

The role of oxide layers in solder joints

“…Oxide layers of reproducible composition and defined thickness were prepared by reactive sputter deposition. For this, an ion beam chamber was used which is described elsewhere [19]. An oxygen pressure of 10 −2 Pa during the deposition enabled the formation of NiO layers of a stoichiometry that corresponds to the composition of natural nickel oxide.…”